Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | MLYCD | O95822 | 5/20 | 0.45 |
| ▸ | NR1H3 | Q13133 | 9/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 8/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | RORC | P51449 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13163546 | 0.84 | NR1H3 (0.45) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL14556842 | 0.83 | NR1H3 (0.44) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL19335436 | 0.83 | KCNN4 (0.43) | NR1H3NR1H2LMNANPSR1 | |
| SCHEMBL24225758 | 0.80 | LMNA (0.41) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL18479637 | 0.78 | ELANE (0.59) | SMN1; SMN2MLYCDNR1H3NR1H2 | |
| SCHEMBL15840364 | 0.78 | SMN1; SMN2 (0.47) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL28313039 | 0.76 | MAPT (0.47) | SMN1; SMN2LMNAHTTNPSR1 | |
| SCHEMBL8583669 | 0.72 | NR1H3 (0.47) | SMN1; SMN2MLYCDNR1H3NR1H2RORC | |
| SCHEMBL14086284 | 0.72 | ELANE (0.41) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL131990 | 0.71 | NR1H2 (0.68) | SMN1; SMN2MLYCDNR1H3NR1H2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| EP-4134388-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-15 | — | — | EP | disclosed |
| US-20220026803-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20220026804-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |