SCHEMBL24254808

SCHEMBL24254808

Cc1cc(-c2ccc(N(c3ccc(-c4cc(C)cc(C(F)(F)F)c4)cc3)c3ccc(N(c4ccccc4)c4c(F)c(F)c5c(F)c(F)c(F)c(F)c5c4F)cc3)cc2)cc(C(F)(F)F)c1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
RXRA P19793 7/20 0.35
RXRB P28702 7/20 0.35
RXRG P48443 5/20 0.33
KIF11 P52732 1/20 0.33
TAS2R14 Q9NYV8 1/20 0.31
NOTUM Q6P988 1/20 0.30
DHFR P00374 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254819 0.91 KIF11 (0.34) RXRARXRBRXRGKIF11TAS2R14
SCHEMBL24254825 0.82 KIF11 (0.36) RXRARXRBRXRGKIF11TAS2R14
SCHEMBL24254822 0.81 TACR1 (0.34) TAS2R14
SCHEMBL16153692 0.79 RXRA (0.45) RXRARXRBRXRGKIF11NOTUM
SCHEMBL24254823 0.78 TACR1 (0.34) TAS2R14
SCHEMBL24254746 0.77 KIF11 (0.31) RXRARXRBRXRGKIF11
SCHEMBL24254752 0.77 KIF11 (0.31) RXRARXRBRXRGKIF11
SCHEMBL16386580 0.76 KIF11 (0.47) RXRARXRBRXRGKIF11TAS2R14
SCHEMBL24254648 0.75
SCHEMBL25546727 0.74 RXRA (0.37) RXRARXRBRXRGKIF11NOTUM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed