SCHEMBL24254918

SCHEMBL24254918

Nc1cccc(N)c1-c1ccc(-c2c(N)cccc2N)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 6/20 0.47
ALDH1A1 P00352 6/20 0.47
TSHR P16473 5/20 0.47
HSD17B10 Q99714 4/20 0.47
TDP1 Q9NUW8 4/20 0.47
HPGD P15428 2/20 0.47
ALOX15 P16050 2/20 0.47
CASP1 P29466 1/20 0.47
CASP7 P55210 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
PIK3CA P42336 1/20 0.45
ADORA2A P29274 2/20 0.42
PTPRC P08575 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.40
KEAP1 Q14145 1/20 0.39
CD44 P16070 1/20 0.39
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
THRB P10828 1/20 0.38
TP53 P04637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28877117 0.91 CYP3A4 (0.53) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL5754263 0.88 ALDH1A1 (0.55) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL30234670 0.87 CYP3A4 (0.43) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL27458150 0.87 CYP3A4 (0.48) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL25011940 0.87 CD44 (0.54) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL28860865 0.87 ESR1 (0.48) CYP3A4ALDH1A1HSD17B10HPGDALOX15
SCHEMBL3036922 0.82 CYP3A4 (0.57) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL1891143 0.81 MAPT (0.48) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL23420928 0.81 CYP3A4 (0.37) CYP3A4ALDH1A1TSHRHSD17B10TDP1
SCHEMBL28877116 0.81 ALDH1A1 (0.38) CYP3A4ALDH1A1TSHRHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed