Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LAP3 | P28838 | 6/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | MMP2 | P08253 | 1/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | METAP1 | P53582 | 2/20 | 0.44 |
| ▸ | ANPEP | P15144 | 6/20 | 0.42 |
| ▸ | ERAP1 | Q9NZ08 | 1/20 | 0.42 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.42 |
| ▸ | OTC | P00480 | 1/20 | 0.42 |
| ▸ | FDPS | P14324 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL28448377 | 0.85 | LAP3 (0.60) | LAP3METAP1ANPEPERAP1ERAP2 | |
| Phosphoric Acid SCHEMBL29275124 | 0.85 | LAP3 (0.60) | LAP3METAP1ANPEPERAP1ERAP2 | |
| SCHEMBL243100 | 0.83 | LAP3 (0.59) | LAP3METAP1ANPEPALDH1A1TDP1 | |
| Phosphoric Acid SCHEMBL28859152 | 0.82 | LAP3 (0.57) | LAP3METAP1ANPEPERAP1ERAP2 | |
| Phosphoric Acid SCHEMBL28859154 | 0.82 | LAP3 (0.57) | LAP3METAP1ANPEPERAP1ERAP2 | |
| Medronic Acid SCHEMBL1921134 | 0.82 | KDM4E (0.62) | LAP3KDM4EMMP2THRBMAPK1 | |
| Medronic Acid SCHEMBL18066158 | 0.82 | KDM4E (0.62) | LAP3KDM4EMMP2THRBMAPK1 | |
| Medronic Acid SCHEMBL28647857 | 0.82 | KDM4E (0.62) | LAP3KDM4EMMP2THRBMAPK1 | |
| Medronic Acid SCHEMBL2383175 | 0.80 | KDM4E (0.59) | LAP3KDM4EMMP2THRBMAPK1 | |
| Medronic Acid SCHEMBL10395331 | 0.79 | KDM4E (0.67) | LAP3KDM4EMMP2THRBMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2518759-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING AN ETCHANT | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-06-21 | — | — | EP | claimed |
| US-9177827-B2 | Etchant and method for manufacturing semiconductor device using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-03 | — | — | US | claimed |
| EP-2518759-A1 | ETCHANT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-10-31 | — | — | EP | claimed |
| US-20120270396-A1 | ETCHANT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | MITSUBISHI GAS CHEMICAL (JP) | 2012-10-25 | — | — | US | claimed |
| US-9845538-B2 | Etching agent, etching method and etching agent preparation liquid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| EP-2518759-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING AN ETCHANT | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-06-21 | — | — | EP | disclosed |
| US-20160177457-A1 | ETCHING AGENT, ETCHING METHOD AND ETCHING AGENT PREPARATION LIQUID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-23 | — | — | US | disclosed |
| US-9177827-B2 | Etchant and method for manufacturing semiconductor device using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-03 | — | — | US | disclosed |
| EP-1679361-B1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEM IND LTD (JP) | 2015-06-24 | — | — | EP | disclosed |
| US-8900371-B2 | Cleaning agent for substrate and cleaning method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| EP-2234145-B1 | ETCHING AGENT, ETCHING METHOD AND LIQUID FOR PREPARING ETCHING AGENT | WAKO PURE CHEM IND LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| EP-2518759-A1 | ETCHANT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-10-31 | — | — | EP | disclosed |
| US-20120270396-A1 | ETCHANT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | MITSUBISHI GAS CHEMICAL (JP) | 2012-10-25 | — | — | US | disclosed |
| US-20120000485-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20070235061-A1 | Cleaning Agent for Substrate and Cleaning Method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| EP-1679361-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-12 | — | — | EP | disclosed |