Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LAP3 | P28838 | 1/20 | 0.59 |
| ▸ | ANPEP | P15144 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | S1PR2 | O95136 | 5/20 | 0.47 |
| ▸ | S1PR1 | P21453 | 5/20 | 0.47 |
| ▸ | S1PR3 | Q99500 | 5/20 | 0.47 |
| ▸ | S1PR4 | O95977 | 4/20 | 0.47 |
| ▸ | METAP1 | P53582 | 2/20 | 0.44 |
| ▸ | ENPEP | Q07075 | 1/20 | 0.44 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.44 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6369172 | 0.90 | LPAR3 (0.58) | LAP3ANPEPALDH1A1TDP1S1PR2 | |
| Phosphoric Acid SCHEMBL29275124 | 0.85 | LAP3 (0.60) | LAP3ANPEPALDH1A1TDP1METAP1 | |
| Phosphoric Acid SCHEMBL28448377 | 0.85 | LAP3 (0.60) | LAP3ANPEPALDH1A1TDP1METAP1 | |
| Medronic Acid SCHEMBL242844 | 0.83 | LAP3 (0.59) | LAP3ANPEPALDH1A1TDP1METAP1 | |
| Phosphoric Acid SCHEMBL28859152 | 0.82 | LAP3 (0.57) | LAP3ANPEPALDH1A1TDP1METAP1 | |
| Phosphoric Acid SCHEMBL28859154 | 0.82 | LAP3 (0.57) | LAP3ANPEPALDH1A1TDP1METAP1 | |
| Ethylamine SCHEMBL11312343 | 0.79 | ALDH1A1 (0.61) | LAP3ANPEPALDH1A1TDP1LPAR3 | |
| Methylamine SCHEMBL10871952 | 0.78 | ALDH1A1 (0.59) | LAP3ANPEPALDH1A1TDP1ENPEP | |
| SCHEMBL6512048 | 0.78 | TYMS (0.64) | ANPEPALDH1A1TDP1LPAR3LPAR2 | |
| SCHEMBL5059525 | 0.77 | S1PR1 (0.62) | LAP3ANPEPALDH1A1TDP1S1PR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11203731-B2 | Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210130735-A1 | COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2021-05-06 | — | — | US | disclosed |
| EP-1679361-B1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEM IND LTD (JP) | 2015-06-24 | — | — | EP | disclosed |
| US-8900371-B2 | Cleaning agent for substrate and cleaning method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20120000485-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20070235061-A1 | Cleaning Agent for Substrate and Cleaning Method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| EP-1679361-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20050204639-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-22 | — | — | US | disclosed |
| US-20050205837-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-22 | — | — | US | disclosed |