Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL2783217 | 1.00 | — | — | |
| Bicarbonate SCHEMBL1318468 | 0.95 | — | — | |
| Bicarbonate SCHEMBL457108 | 0.94 | — | — | |
| Bicarbonate SCHEMBL541758 | 0.94 | CA4 (0.78) | — | |
| Bicarbonate SCHEMBL2402027 | 0.94 | — | — | |
| Bicarbonate SCHEMBL192950 | 0.94 | — | — | |
| Bicarbonate SCHEMBL5888860 | 0.91 | CA4 (0.58) | — | |
| Bicarbonate SCHEMBL23525300 | 0.89 | — | — | |
| Bicarbonate SCHEMBL1004788 | 0.89 | — | — | |
| Bicarbonate SCHEMBL8040237 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103957731-B | Zero calorie of polyphenol aqueous dispersion | 百事可乐公司 | 2016-09-21 | — | — | CN | claimed |
| CN-110476114-A | Aligning agent for liquid crystal, liquid crystal orientation film and liquid crystal indicate element | NISSAN CHEMICAL IND LTD | 2019-11-19 | — | — | CN | disclosed |
| CN-105683838-B | Photosensitive resin composition, method for producing cured film, liquid crystal display device, and organic EL display device | 富士胶片株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-110325518-A | Thiazolium compounds and herbicide | 日本欧爱特农业科技株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-110291135-A | The manufacturing method of the latex of synthetic rubber | 日本瑞翁株式会社 | 2019-09-27 | — | — | CN | disclosed |
| CN-109923132-A | synthetic polyisoprene latex | 日本瑞翁株式会社 | 2019-06-21 | — | — | CN | disclosed |
| CN-109688992-A | The manufacturing method of packaging structure | 日本瑞翁株式会社 | 2019-04-26 | — | — | CN | disclosed |
| CN-108779187-A | The manufacturing method of polymer emulsion | 日本瑞翁株式会社 | 2018-11-09 | — | — | CN | disclosed |
| CN-108699251-A | The manufacturing method of polymer emulsion | 日本瑞翁株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108699252-A | Method for producing polymer latex | 日本瑞翁株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108473784-A | Polyfunctional polymerizable compound and coloring composition | 富士胶片和光纯药株式会社 | 2018-08-31 | — | — | CN | disclosed |
| CN-108431118-A | Latex composition | 日本瑞翁株式会社 | 2018-08-21 | — | — | CN | disclosed |
| CN-106716252-A | Photosensitive resin composition, method for producing cured film, liquid crystal display device, organic electroluminescence display device, and touch panel | 富士胶片株式会社 | 2017-05-24 | — | — | CN | disclosed |
| CN-105980931-A | Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device, organic el display device, and touch panel display device | 富士胶片株式会社 | 2016-09-28 | — | — | CN | disclosed |
| EP-2401654-A1 | RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM Corporation (JP) | 2012-01-04 | — | — | EP | disclosed |
| US-8034547-B2 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2011-10-11 | — | — | US | disclosed |
| WO-2010098493-A1 | RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | WO | disclosed |
| US-20090011366-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| US-5710278-A | Herbicidal 1-pyridyltetrazolinones | NIHON BAYER AGROCHEM K.K. (JP) | 1998-01-20 | — | — | US | disclosed |
| US-5281580-A | Respiratory system disorders | TOYO JOZO COMPANY, LTD. (JP) | 1994-01-25 | — | — | US | disclosed |