Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.66 |
| ▸ | HPGD | P15428 | 3/20 | 0.66 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | HSD17B3 | P37058 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | CES2 | O00748 | 1/20 | 0.46 |
| ▸ | CES1 | P23141 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.46 |
| ▸ | STS | P08842 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | HTR7 | P34969 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | THRA | P10827 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7195006 | 0.93 | HSD17B3 (0.64) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10872418 | 0.90 | HSD17B3 (0.59) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10874949 | 0.88 | HSD17B3 (0.60) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL4419356 | 0.87 | HSD17B3 (0.58) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10879508 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL243463 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10875468 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10877102 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10877296 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 | |
| SCHEMBL10879487 | 0.87 | HSD17B3 (0.61) | L3MBTL1HPGDSMN1; SMN2ALDH1A1HSD17B3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115551962-A | Composition comprising a fatty acid ester and a fatty acid ester | 电化株式会社 | 2022-12-30 | — | — | CN | claimed |
| US-20250355352-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-20250355355-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-20250355351-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| CN-118434814-A | Pressure-sensitive adhesive sheet | 日东电工株式会社 | 2024-08-02 | — | — | CN | disclosed |
| US-20240241438-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-18 | — | — | US | disclosed |
| EP-4394001-A1 | REACTIVE DYE AND PHOTOSENSITIVE COMPOSITION USING SAME | Duksan Neolux Co., Ltd (KR) | 2024-07-03 | — | — | EP | disclosed |
| WO-2024101181-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING FILM, PATTERN FORMATION METHOD, AND LIGHT EMITTING ELEMENT | 信越化学工業株式会社 | 2024-05-16 | — | — | WO | disclosed |
| CN-117991588-A | Photosensitive resin composition, photosensitive resin layer using same, color filter, and display device | 三星SDI株式会社 | 2024-05-07 | — | — | CN | disclosed |
| WO-2024075586-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING FILM, PATTERN FORMATION METHOD, AND LIGHT-EMITTING ELEMENT | 信越化学工業株式会社 | 2024-04-11 | — | — | WO | disclosed |
| US-20050192384-A1 | Additive composition for increasing the storage stability of ethylenically unsaturated resins | CIBA SPECIALTY CHEMICALS CORP. | 2005-09-01 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| EP-1235863-B1 | USE OF AN ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | CIBA SC HOLDING AG (CH) | 2005-01-26 | — | — | EP | disclosed |
| CN-1570764-A | Light-sensitive resin composition for black matrix | CHI MEI CORP (CN) | 2005-01-26 | — | — | CN | disclosed |
| US-6733847-B2 | DEPOSITION OF ELECTRON- OR H-DONORS HAVING AT LEAST ONE ETHYLENICALLY UNSATURATED GROUP ON A PLASMA-ACTIVATED SUBSTRATE, CURING BY IONIZATION RADIATION OR ELECTROMAGNETIC ENERGY | CIBA SPECIALTY CHEMICALS CORPORATION | 2004-05-11 | — | — | US | disclosed |
| US-6596445-B1 | Initiators for photopolymerization of radically polymerizable compounds | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-07-22 | — | — | US | disclosed |
| US-20030129322-A1 | Process for the production of strongly adherent surface-coatings by plasma-activated grafting | CIBA SPECIALTY CHEMICALS CORP. | 2003-07-10 | — | — | US | disclosed |
| US-6548121-B1 | Subjecting substrate to action of low-temperature plasma discharge or radiation, applying photoinitiator containing ethylenically unsaturated group, curing, depositing metal or oxide | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-04-15 | — | — | US | disclosed |
| EP-1235863-A1 | ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | Ciba SC Holding AG (CH) | 2002-09-04 | — | — | EP | disclosed |
| WO-2001042313-A1 | ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2001-06-14 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250355351-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | LCP1, CD79B, ARCN1 | L3MBTL1 4465/4885HPGD 2934/4885SMN1; SMN2 3873/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.