SCHEMBL243359

SCHEMBL243359

CCCCCCc1ccc2[nH]nnc2c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 1/20 0.45
HTR1D P28221 1/20 0.45
HTR1B P28222 1/20 0.45
S1PR1 P21453 2/20 0.43
S1PR4 O95977 1/20 0.43
S1PR5 Q9H228 1/20 0.43
TLR8 Q9NR97 5/20 0.43
ESR1 P03372 2/20 0.42
ADRA2A P08913 2/20 0.42
ADORA3 P0DMS8 2/20 0.42
TACR2 P21452 2/20 0.42
SLC6A2 P23975 2/20 0.42
SLC6A4 P31645 2/20 0.42
SLC6A3 Q01959 2/20 0.42
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 1/20 0.42
LMNA P02545 1/20 0.42
SHBG P04278 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7846372 1.00 HTR1A (0.45) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL1019393 1.00 HTR1A (0.45) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL10999399 1.00 HTR1A (0.45) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL1018863 1.00 HTR1A (0.45) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL11673325 1.00 HTR1A (0.45) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL242143 0.98 HTR1A (0.43) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL242265 0.94 HTR1A (0.41) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL6365081 0.92 HTR1A (0.40) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL28419742 0.92 HTR1A (0.40) HTR1AHTR1DHTR1BS1PR1S1PR4
SCHEMBL30387310 0.92 HTR1A (0.40) HTR1AHTR1DHTR1BS1PR1S1PR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 620 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260042976-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MAT USA INC (US) 2026-02-12 US claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
CN-119410418-A Cleaning solution for removing residues after polyimide etching 湖北兴福电子材料股份有限公司 2025-02-11 CN claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
EP-4381022-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2024-06-12 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
US-20240034958-A1 COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2024-02-01 US claimed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed
CN-100543124-C Substrate is with clean-out system and purging method WAKO PURE CHEM IND LTD (JP) 2009-09-23 CN claimed
US-20070128872-A1 Polishing composition and polishing method SHOWA DENKO K.K. (JP) 2007-06-07 US claimed
US-20070060028-A1 CMP SLURRY DELIVERY SYSTEM AND METHOD OF MIXING SLURRY THEREOF UNITED MICROELECTRONICS CORP. (TW) 2007-03-15 US claimed
CN-1902291-A Polishing composition and polishing method SHOWA DENKO KK (JP) 2007-01-24 CN claimed
US-20060227458-A1 Corrosion inhibitors and methods for magnetic media and magnetic head read-write device PACE TECHNOLOGIES CORPORATION (US) 2006-10-12 US claimed
US-20060191871-A1 CMP SLURRY DELIVERY SYSTEM AND METHOD OF MIXING SLURRY THEREOF UNITED MICROELECTRONICS CORP. (TW) 2006-08-31 US claimed
EP-1687387-A1 POLISHING COMPOSITION COMPRISING PHOSPHATE ESTERS AND POLISHING METHOD Showa Denko K.K. (JP) 2006-08-09 EP claimed
WO-2005047409-A1 POLISHING COMPOSITION AND POLISHING METHOD SHOWA DENKO K.K. (JP) 2005-05-26 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042976-A1 COMPOSITIONS AND METHODS OF USE THEREOF ACP1, PLOD1, CA1 HTR1A 1699/4885HTR1D 1951/4885HTR1B 3217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.