Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR5A1 | Q13285 | 1/20 | 0.63 |
| ▸ | LTA4H | P09960 | 4/20 | 0.56 |
| ▸ | TP53 | P04637 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | PLA2G4B | P0C869 | 5/20 | 0.54 |
| ▸ | RARB | P10826 | 3/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.51 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4840506 | 1.00 | NR5A1 (0.63) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL1127790 | 1.00 | NR5A1 (0.63) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL838115 | 1.00 | NR5A1 (0.63) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| Methane SCHEMBL2440133 | 0.98 | NR5A1 (0.61) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| Ethane SCHEMBL2437543 | 0.98 | NR5A1 (0.61) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL859596 | 0.94 | LTA4H (0.55) | NR5A1LTA4HTP53TSHRLMNA | |
| SCHEMBL838064 | 0.93 | LTA4H (0.64) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL2224932 | 0.93 | LTA4H (0.64) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL145006 | 0.93 | LTA4H (0.64) | NR5A1LTA4HTP53TSHRPLA2G4B | |
| SCHEMBL12748728 | 0.93 | LTA4H (0.64) | NR5A1LTA4HTP53TSHRPLA2G4B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | claimed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | claimed |
| EP-0611813-B1 | One-component air-activatable polymerisable compositions containing onium salts | LOCTITE IRELAND LTD (IE) | 1998-12-30 | — | — | EP | claimed |
| US-9829605-B2 | Polarized film, optical film, and image display device | NITTO DENKO CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-9810981-B2 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20170184973-A1 | ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, METHOD OF PRODUCING ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, STORAGE CONTAINER OF ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170115571-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20160342083-A1 | PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9429840-B2 | Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-30 | — | — | US | disclosed |
| US-20160152002-A1 | TRANSPARENT CONDUCTIVE LAMINATED FILM, METHOD FOR MANUFACTURING SAME, AND TOUCH PANEL | NITTO DENKO CORPORATION (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160147156-A1 | PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-7338737-B2 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-04 | — | — | US | disclosed |
| US-7297452-B2 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20070254221-A1 | Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. | SAMSUNG DISPLAY CO., LTD. (KR) | 2007-11-01 | — | — | US | disclosed |
| US-20070148593-A1 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION | 2007-06-28 | — | — | US | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170184973-A1 | ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, METHOD OF PRODUCING ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, STORAGE CONTAINER OF ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF PRODUCING ELECTRONIC DEVICE | MYB, NCL, SMYD2 | NR5A1 3649/4885LTA4H 4311/4885TP53 1507/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.