SCHEMBL243710

SCHEMBL243710

CCNOCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL17673144 0.90 ALDH1A1 (0.35)
Acetic Acid SCHEMBL5091173 0.88 ACHE (0.34)
SCHEMBL9736798 0.85 MEN1 (0.52)
SCHEMBL2058399 0.83
SCHEMBL455723 0.81 TP53 (0.31)
SCHEMBL2058431 0.78
SCHEMBL309238 0.75
SCHEMBL22009098 0.74
SCHEMBL28134441 0.73
Alcohol SCHEMBL11176764 0.73 ALDH1A1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
JP-4223687-B2 2009-02-12 JP claimed
EP-1119579-A4 ANTISENSE MODULATION OF BCL-X EXPRESSION ISIS PHARMACEUTICALS INC (US) 2003-01-29 EP claimed
JP-2002526093-A 2002-08-20 JP claimed
EP-1119579-A1 ANTISENSE MODULATION OF BCL-X EXPRESSION ISIS PHARMACEUTICALS, INC. (US) 2001-08-01 EP claimed
WO-2000020432-A1 ANTISENSE MODULATION OF BCL-X EXPRESSION ISIS PHARMACEUTICALS, INC. (US) 2000-04-13 WO claimed
EP-0279954-B1 AMIDES OF EICOSATETRAYNOIC ACID, THEIR PHARMACEUTICAL AND COSMETIC USE, THEIR PREPARATION AND PROCESS FOR THE PREPARATION OF EICOSATETRAYNOIC ACID CENTRE INTERNATIONAL DE RECHERCHES DERMATOLOGIQUES GALDERMA - CIRD GALDERMA (FR) 1993-03-17 EP claimed
WO-2023198652-A1 CHEMICALLY-MODIFIED ADENO-ASSOCIATED VIRUSES CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2023-10-19 WO disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN disclosed
CN-101300223-B Alkylamino alkyloxy (alcohol) monoalkyl ether for acid gas scrubbing process EXXONMOBIL RES & ENG CO 2013-07-03 CN disclosed
CN-101258218-B Tetraorganoammonium and tetraorganophosphonium salts for acid gas scrubbing process EXXONMOBIL RES & ENG CO 2012-11-28 CN disclosed
US-8293788-B2 2-phenylpropionic acid derivatives and pharmaceutical compositions containing them DOMPÉ FARMACEUTICI S.P.A. (IT) 2012-10-23 US disclosed
CN-101263216-B Absorbent composition containing molecules with a hindered amine and a metal sulfonate, phosphonate or carboxylate structure for acid gas scrubbing process EXXONMOBIL RES & ENG CO 2012-09-05 CN disclosed
EP-0220118-A2 Bicyclic naphthalenic derivatives, process for their preparation and their use in human and veterinary medicine and cosmetics CENTRE INTERNATIONAL DE RECHERCHES DERMATOLOGIQUES GALDERMA - CIRD GALDERMA (FR) 1987-04-29 EP disclosed
EP-0185493-A2 Imidazolinone-containing polymers and copolymers MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-06-25 EP disclosed
US-4568743-A SKIN DISORDERS, COSMETICS GROUPEMENT D'INTERET ECONOMIQUE DIT CENTRE INTERNATIONAL DE RECHERCHES DERMATOLGIQUES C.I.R.D. (FR) 1986-02-04 US disclosed
EP-0053389-B1 PROCESS FOR PREPARING CATIONIC SURFACE ACTIVE AGENTS TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 1985-04-03 EP disclosed
US-4385184-A QUATERNARYL AMMONIUM WITH HYDROXYPHENETHYL GROUP TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 1983-05-24 US disclosed
EP-0053389-A1 Process for preparing cationic surface active agents TOHO CHEMICAL INDUSTRY CO., LTD. (JP) 1982-06-09 EP disclosed