Sugi Predict

Sugi Predict / Compounds / SCHEMBL2437790

SCHEMBL2437790

SCHEMBL2437790

O=S(=O)(Oc1ccc([S+](c2ccccc2)c2ccc(OS(=O)(=O)c3cc(C(F)(F)F)cc(C(F)(F)F)c3)cc2)cc1)c1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NR3C1 P04150 1/20 0.42
▸ PGR P06401 1/20 0.42
▸ AR P10275 1/20 0.42
▸ ESR2 Q92731 1/20 0.42
▸ TDP1 Q9NUW8 3/20 0.42
▸ ENPP3 O14638 6/20 0.41
▸ ENPP1 P22413 5/20 0.41
▸ MAPT P10636 2/20 0.40
▸ CA2 P00918 4/20 0.40
▸ CA1 P00915 2/20 0.40
▸ CA9 Q16790 1/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ MAOB P27338 1/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ KIF11 P52732 1/20 0.37
▸ ENPP2 Q13822 4/20 0.37
▸ MMP1 P03956 1/20 0.36
▸ MMP2 P08253 1/20 0.36
▸ MMP9 P14780 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL2440088 0.99 NR3C1 (0.41) NR3C1PGRARESR2TDP1
Ethane SCHEMBL2439550 0.97 NR3C1 (0.41) NR3C1PGRARESR2TDP1
SCHEMBL3652180 0.97 NR3C1 (0.41) NR3C1PGRARESR2TDP1
Trifluoromethanesulfonic Acid SCHEMBL3421981 0.94 ENPP3 (0.40) NR3C1PGRARESR2TDP1
SCHEMBL29745891 0.93 ENPP3 (0.40) NR3C1PGRARESR2TDP1
SCHEMBL29745985 0.92 NR3C1 (0.37) NR3C1PGRARESR2TDP1
SCHEMBL29745804 0.92 AR (0.40) NR3C1PGRARESR2TDP1
SCHEMBL29745990 0.92 NR3C1 (0.37) NR3C1PGRARESR2TDP1
SCHEMBL2441564 0.92 AR (0.40) NR3C1PGRARESR2TDP1
SCHEMBL2434759 0.91 ENPP3 (0.39) NR3C1PGRARESR2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 — — EP claimed
US-7678528-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-03-16 — — US claimed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 — — EP claimed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 — — WO claimed
US-20070111138-A1 Photoactive compounds MERCK PATENT GMBH (DE) 2007-05-17 — — US claimed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 — — US disclosed
US-20130236833-A1 COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-09-12 — — US disclosed
US-7833693-B2 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity AZ ELECTRONIC MATERIALS USA CORP. 2010-11-16 — — US disclosed
US-7678528-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-03-16 — — US disclosed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 — — EP disclosed
US-7521170-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-04-21 — — US disclosed
US-20090087782-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2009-04-02 — — US disclosed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 — — WO disclosed
US-20070111138-A1 Photoactive compounds MERCK PATENT GMBH (DE) 2007-05-17 — — US disclosed