SCHEMBL24405078

SCHEMBL24405078

COCOc1cc(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)cc(OCOC)c1OCOC

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.35
▸ EGFR P00533 1/20 0.32
▸ ELANE P08246 1/20 0.31
▸ ALOX5 P09917 1/20 0.30
▸ BACE1 P56817 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24405047 0.86 ELANE (0.39) PTPN1EGFRELANEBACE1
SCHEMBL24405079 0.75 ELANE (0.31) ELANE
SCHEMBL24405081 0.74 ELANE (0.36) ELANE
SCHEMBL20383831 0.73 ELANE (0.44) ELANE
SCHEMBL24405045 0.73 — —
SCHEMBL21776170 0.72 NPSR1 (0.33) ELANEALOX5
SCHEMBL14477140 0.72 ESR1 (0.36) ELANE
SCHEMBL21943829 0.72 ELANE (0.33) ELANE
SCHEMBL25068947 0.71 ELANE (0.45) ELANE
SCHEMBL24405082 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11327399-B2 Photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-10 — — US disclosed
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