⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24405081 | 0.89 | ELANE (0.36) | — | |
| SCHEMBL24405083 | 0.87 | ELANE (0.36) | — | |
| SCHEMBL24405004 | 0.73 | ELANE (0.40) | — | |
| SCHEMBL13241474 | 0.72 | ALDH1A1 (0.31) | — | |
| SCHEMBL24859820 | 0.71 | ELANE (0.30) | — | |
| SCHEMBL24405078 | 0.71 | PTPN1 (0.35) | — | |
| SCHEMBL24405079 | 0.70 | ELANE (0.31) | — | |
| SCHEMBL24405045 | 0.70 | — | — | |
| SCHEMBL21943829 | 0.69 | ELANE (0.33) | — | |
| SCHEMBL14477140 | 0.69 | ESR1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |