SCHEMBL21776170

SCHEMBL21776170

COc1cc(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)cc(OC)c1C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPSR1 Q6W5P4 2/20 0.33
▸ LMNA P02545 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ ALOX5 P09917 2/20 0.32
▸ TSHR P16473 2/20 0.31
▸ PDK1 Q15118 1/20 0.30
▸ PDK2 Q15119 1/20 0.30
▸ PDK3 Q15120 1/20 0.30
▸ PDK4 Q16654 1/20 0.30
▸ ELANE P08246 1/20 0.30
▸ PTGS1 P23219 1/20 0.30
▸ PTGS2 P35354 1/20 0.30
▸ NR1H2 P55055 1/20 0.30
▸ NR1H3 Q13133 1/20 0.30
▸ NR3C1 P04150 1/20 0.30
▸ GLA P06280 1/20 0.30
▸ L3MBTL1 Q9Y468 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18030078 0.82 LMNA (0.35) NPSR1LMNAMAPK1TSHRNR1H2
SCHEMBL26078924 0.81 NPSR1 (0.36) NPSR1LMNAMAPK1HSD17B10ALDH1A1
SCHEMBL20383831 0.76 ELANE (0.44) LMNAHSD17B10ALDH1A1TSHRELANE
SCHEMBL21776385 0.76 LMNA (0.43) NPSR1LMNAMAPK1ELANENR1H2
SCHEMBL21776384 0.75 NR1H3 (0.39) LMNAPDK1PDK2PDK3PDK4
SCHEMBL21776169 0.74 KCNJ11 (0.38) NPSR1ELANEL3MBTL1MAPT
SCHEMBL21776168 0.73 LMNA (0.36) NPSR1LMNAMAPK1NR1H2NR1H3
SCHEMBL21943829 0.73 ELANE (0.33) ELANE
SCHEMBL25068947 0.72 ELANE (0.45) LMNAMAPK1HSD17B10ALDH1A1ELANE
SCHEMBL24405078 0.72 PTPN1 (0.35) ALOX5ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 — — US disclosed
US-20200064735-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-02-27 — — US disclosed
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