SCHEMBL24426196

SCHEMBL24426196

CCCC1(CCC)c2cc(C(=O)C(=N)CC3CCCCC3)ccc2-c2ccc(C(=O)c3ccccc3C)cc21

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ P2RX7 Q99572 1/20 0.36
▸ FFAR1 O14842 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ HTT P42858 1/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ CYP1A2 P05177 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ CCR5 P51681 1/20 0.32
▸ MAPK13 O15264 1/20 0.31
▸ MAPK12 P53778 1/20 0.31
▸ MAPK11 Q15759 1/20 0.31
▸ MAPK14 Q16539 1/20 0.31
▸ PDK2 Q15119 1/20 0.31
▸ CHRM2 P08172 1/20 0.31
▸ CRHR1 P34998 1/20 0.31
▸ HDAC1 Q13547 1/20 0.31
▸ HDAC6 Q9UBN7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29620213 0.85 FFAR1 (0.36) P2RX7FFAR1TDP1ALDH1A1HTT
SCHEMBL18122994 0.84 FFAR1 (0.33) P2RX7FFAR1TDP1
SCHEMBL24426162 0.83 PDK2 (0.41) ALDH1A1HTTNPC1RAB9ACYP1A2
Acetic Acid SCHEMBL28414198 0.81 FFAR1 (0.35) P2RX7FFAR1CCR5CHRM2
Acetic Acid SCHEMBL29503085 0.81 FFAR1 (0.35) P2RX7FFAR1CCR5CHRM2
SCHEMBL17084351 0.79 ALDH1A1 (0.42) ALDH1A1HTTMAPK13MAPK12MAPK11
SCHEMBL30266914 0.78 PDK2 (0.42) ALDH1A1HTTNPC1RAB9AMAPK13
SCHEMBL17084352 0.78 PDK2 (0.42) ALDH1A1HTTNPC1RAB9AMAPK13
SCHEMBL29501798 0.77 CHRM1 (0.38) FFAR1CCR5CHRM2
SCHEMBL28528297 0.76 PDK2 (0.41) PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023127402-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING PATTERNED CURED FILM 東京応化工業株式会社 2023-07-06 — — WO disclosed
WO-2023120077-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-06-29 — — WO disclosed
WO-2023120076-A1 PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-06-29 — — WO disclosed
WO-2023074266-A1 PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-05-04 — — WO disclosed
WO-2023058418-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-04-13 — — WO disclosed
WO-2023047855-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-03-30 — — WO disclosed
WO-2023047856-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-03-30 — — WO disclosed
WO-2022181562-A1 PHOTOCURABLE LIQUID COMPOSITION, CURED OBJECT, AND METHOD FOR PRODUCING CURED OBJECT 東京応化工業株式会社 2022-09-01 — — WO disclosed
EP-3998324-A1 WAVELENGTH CONVERSION FILM, WAVELENGTH CONVERSION FILM FORMING COMPOSITION, AND CLUSTER-CONTAINING QUANTUM DOT PRODUCTION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2022-05-18 — — EP disclosed
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