Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A known ✓ | P08913 | 1/20 | 0.30 |
| ▸ | ADRA2B known ✓ | P18089 | 1/20 | 0.30 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.35 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.31 |
| ▸ | CCR5 | P51681 | 1/20 | 0.30 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | HTR1A | P08908 | 1/20 | 0.30 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | DRD2 | P14416 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
| ▸ | DRD4 | P21917 | 1/20 | 0.30 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
| ▸ | HRH1 | P35367 | 1/20 | 0.30 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL29503085 | 1.00 | FFAR1 (0.35) | FFAR1P2RX7CCR5CHRM2CHRM4 | |
| SCHEMBL29620213 | 0.87 | FFAR1 (0.36) | FFAR1P2RX7CCR5CHRM2CHRM4 | |
| SCHEMBL18122994 | 0.84 | FFAR1 (0.33) | FFAR1P2RX7 | |
| SCHEMBL18812930 | 0.81 | PDK2 (0.38) | — | |
| SCHEMBL18812929 | 0.81 | PDK2 (0.38) | — | |
| SCHEMBL29372016 | 0.81 | PDK2 (0.38) | — | |
| SCHEMBL24426196 | 0.81 | P2RX7 (0.36) | FFAR1P2RX7CCR5CHRM2 | |
| SCHEMBL28908811 | 0.80 | PDK2 (0.38) | — | |
| SCHEMBL29501798 | 0.79 | CHRM1 (0.38) | FFAR1CCR5CHRM2CHRM4HTR1A | |
| SCHEMBL22355421 | 0.77 | PDK2 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752096-B | Photosensitive resin composition for color filter and color filter | 常州正洁智造科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-115128899-A | Photosensitive resin composition with improved system hue stability | 常州正洁智造科技有限公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-111752091-B | Application of HABI mixed photoinitiator in UVLED photocuring | 常州正洁智造科技有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-112835261-B | EO/PO modified 9-phenylacridine photosensitizer and application thereof | 常州强力电子新材料股份有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-114442425-A | Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board | 常州正洁智造科技有限公司 | 2022-05-06 | — | — | CN | disclosed |
| CN-114326299-A | Photosensitive resin composition, optical filter and application | 常州强力电子新材料股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114326309-A | Photosensitive resin composition and application thereof | 常州正洁智造科技有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-113929624-A | Pyrazoline compound, photosensitive resin composition and patterning method | 常州强力电子新材料股份有限公司 | 2022-01-14 | — | — | CN | disclosed |
| CN-113527207-A | Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photocuring composition and photoresist | 常州强力电子新材料股份有限公司 | 2021-10-22 | — | — | CN | disclosed |
| CN-112835261-A | EO/PO modified 9-phenylacridine photosensitizer and application thereof | 常州强力电子新材料股份有限公司 | 2021-05-25 | — | — | CN | disclosed |
| CN-112062721-A | HABI photoinitiator capable of improving system stability and application thereof | 常州正洁智造科技有限公司 | 2020-12-11 | — | — | CN | disclosed |
| CN-111752091-A | Application of HABI mixed photoinitiator in UVLED photocuring | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111747897-A | Hexaarylbisimidazole photoinitiator and application thereof | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752096-A | Photosensitive resin composition for color filter and color filter | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111258180-A | Hexaarylbisimidazole mixed photoinitiator and application thereof | 常州格林感光新材料有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-111258181-A | Hexaarylbisimidazole mixed photoinitiator | 常州格林感光新材料有限公司 | 2020-06-09 | — | — | CN | disclosed |