SCHEMBL2442828

SCHEMBL2442828

CC(C)(c1ccccc1)c1cc(C(C)(c2ccc(O)cc2)c2ccc(O)cc2)ccc1O

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 8/20 0.65
ESR2 Q92731 6/20 0.65
ALDH1A1 P00352 4/20 0.59
CYP3A4 P08684 2/20 0.59
HSD17B10 Q99714 3/20 0.47
TSHR P16473 2/20 0.47
HPGD P15428 2/20 0.47
AR P10275 1/20 0.47
SLC6A2 P23975 1/20 0.47
SLC6A4 P31645 1/20 0.47
HTR6 P50406 1/20 0.47
ESRRG P62508 1/20 0.47
SLC6A3 Q01959 1/20 0.47
LMNA P02545 2/20 0.42
TYR P14679 2/20 0.42
ALOX15 P16050 2/20 0.42
NR1I2 O75469 1/20 0.42
CYP2C9 P11712 1/20 0.42
MIF P14174 1/20 0.42
HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18635220 0.90 ESR1 (0.69) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL18635219 0.90 ESR1 (0.69) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL1538005 0.89 ESR1 (0.59) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL29547368 0.84 ESR1 (0.59) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL29490659 0.84 ESR1 (0.59) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL123763 0.84 ESR1 (0.59) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL745012 0.84 ESR1 (0.59) ESR1ESR2ALDH1A1CYP3A4HSD17B10
Bisphenol A SCHEMBL5274859 0.84 ESR1 (0.81) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL11205966 0.83 ALDH1A1 (0.53) ESR1ESR2ALDH1A1CYP3A4HSD17B10
SCHEMBL836617 0.83 ESR1 (0.68) ESR1ESR2ALDH1A1CYP3A4HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11320739-B2 Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate JSR CORPORATION (JP) 2022-05-03 US disclosed
US-20180348633-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING PATTERNED SUBSTRATE JSR CORPORATION (JP) 2018-12-06 US disclosed
EP-2368925-B1 Aerogel, composition for the aerogel, and method of making the aerogel SAMSUNG ELECTRONICS CO LTD (KR) 2016-05-11 EP disclosed
EP-2792665-A1 LIQUID REPELLENT COMPOUND, LIQUID REPELLENT POLYMER, CURABLE COMPOSITION, COATING COMPOSITION, ARTICLE HAVING CURED FILM, ARTICLE HAVING PATTERN WITH LYOPHILIC REGION AND LIQUID REPELLENT REGION, AND METHOD FOR PRODUCING SAME Asahi Glass Company, Limited (JP) 2014-10-22 EP disclosed
US-8586642-B2 Aerogel, composition for the aerogel, and method of making the aerogel SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-11-19 US disclosed
US-20110237698-A1 AEROGEL, COMPOSITION FOR THE AEROGEL, AND METHOD OF MAKING THE AEROGEL SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-09-29 US disclosed
EP-2368925-A1 Aerogel, composition for the aerogel, and method of making the aerogel SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-09-28 EP disclosed
US-7223520-B2 Limited play optical media device with barrier layers GENERAL ELECTRIC COMPANY (US) 2007-05-29 US disclosed
US-20050136333-A1 Novel optical storage materials based on narrowband optical properties GENERAL ELECTRIC COMPANY 2005-06-23 US disclosed
US-20040152013-A1 Limited play optical media device with barrier layers SABIC INNOVATIVE PLASTICS IP B.V. 2004-08-05 US disclosed
US-20030002431-A1 Limited play data storage media and method for limiting access to data thereon GENERAL ELECTRIC COMPANY 2003-01-02 US disclosed