Malonic Acid

Malonic Acid

SCHEMBL2448629

CC(C)(C)c1ccccc1[S+](c1ccccc1)c1ccccc1.O=C([O-])CC(=O)O

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RBP4 P02753 7/20 0.41
NPSR1 Q6W5P4 1/20 0.37
ALDH1A1 P00352 4/20 0.37
KDM4E B2RXH2 2/20 0.37
GAA P10253 2/20 0.37
RXRA P19793 1/20 0.37
RXRB P28702 1/20 0.37
RXRG P48443 1/20 0.37
TDP1 Q9NUW8 2/20 0.34
TSHR P16473 1/20 0.34
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
ATM Q13315 1/20 0.33
POLB P06746 1/20 0.33
THRB P10828 1/20 0.33
ALOX12 P18054 1/20 0.33
NAMPT P43490 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malonic Acid SCHEMBL2448626 0.94 ALDH1A1 (0.38) RBP4NPSR1ALDH1A1KDM4EGAA
Acetic Acid SCHEMBL2448695 0.87 RXRA (0.40) RBP4NPSR1ALDH1A1KDM4EGAA
Malonic Acid SCHEMBL106051 0.82 RECQL (0.39) ALDH1A1KDM4EGAATDP1CYP2C19
SCHEMBL3200821 0.82 ALDH1A1 (0.43) RBP4NPSR1ALDH1A1KDM4EGAA
SCHEMBL31005109 0.82 ALDH1A1 (0.43) RBP4NPSR1ALDH1A1KDM4EGAA
Bromide SCHEMBL2480522 0.80 ALDH1A1 (0.41) RBP4NPSR1ALDH1A1KDM4EGAA
SCHEMBL31236639 0.79 ALDH1A1 (0.35) RBP4NPSR1ALDH1A1KDM4EGAA
SCHEMBL31005118 0.78 ALDH1A1 (0.43) RBP4NPSR1ALDH1A1KDM4EGAA
SCHEMBL3215140 0.78 ALDH1A1 (0.43) RBP4NPSR1ALDH1A1KDM4EGAA
Malonic Acid SCHEMBL105770 0.74 CA4 (0.46) KDM4EGAATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080196626-A1 High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry MERCK PATENT GMBH (DE) 2008-08-21 US claimed
EP-2450412-B1 Silicone coating composition MERCK PATENT GMBH (DE) 2019-08-28 EP disclosed
EP-2121857-B1 SILICONE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2014-06-04 EP disclosed
EP-2450412-A1 Silicone coating composition AZ Electronic Materials USA Corp. (US) 2012-05-09 EP disclosed
US-8026040-B2 High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry AZ ELECTRONIC MATERIALS USA CORP. (US) 2011-09-27 US disclosed
EP-2121857-A1 SILICONE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2009-11-25 EP disclosed
WO-2008102256-A1 SILICONE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-28 WO disclosed