Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.73 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36133 | 0.91 | ALDH1A1 (0.67) | ALDH1A1LMNAPOLBCYP3A4TP53 | |
| SCHEMBL27848264 | 0.91 | ALDH1A1 (0.67) | ALDH1A1LMNAPOLBCYP3A4TP53 | |
| SCHEMBL28309955 | 0.90 | ALDH1A1 (0.65) | ALDH1A1LMNAPOLBCYP3A4TP53 | |
| SCHEMBL4612527 | 0.90 | ALDH1A1 (0.65) | ALDH1A1LMNAPOLBCYP3A4TP53 | |
| SCHEMBL28161016 | 0.88 | ALDH1A1 (0.58) | ALDH1A1LMNAPOLBCYP2C19NPSR1 | |
| Alcohol SCHEMBL9065899 | 0.87 | ALDH1A1 (0.61) | ALDH1A1LMNAPOLBNPSR1 | |
| Methacrylic Acid SCHEMBL5309818 | 0.87 | ALDH1A1 (0.61) | ALDH1A1LMNAPOLBNPSR1 | |
| SCHEMBL28865467 | 0.86 | ALDH1A1 (0.56) | ALDH1A1LMNAPOLBTSHRCYP3A4 | |
| SCHEMBL11219727 | 0.86 | ALDH1A1 (0.59) | ALDH1A1LMNAPOLBNPSR1 | |
| Tetrahydrofuran SCHEMBL28274651 | 0.86 | ALDH1A1 (0.59) | ALDH1A1LMNAPOLBCYP2C19NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 211 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116376489-A | Dual-curing fluorine-containing epoxy adhesive | 上海本诺电子材料有限公司 | 2023-07-04 | — | — | CN | claimed |
| EP-4644983-A1 | OPTICAL LAMINATE, METHOD FOR MANUFACTURING SAME, AND SMART WINDOW COMPRISING SAME | Dongwoo Fine-Chem Co., Ltd. (KR) | 2025-11-05 | — | — | EP | disclosed |
| CN-119768741-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| WO-2025063731-A1 | COLORED PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER AND IMAGE DISPLAY DEVICE MANUFACTURED USING SAME | 동우 화인켐 주식회사 | 2025-03-27 | — | — | WO | disclosed |
| CN-119604817-A | Positive photosensitive resin composition | 日产化学株式会社 | 2025-03-11 | — | — | CN | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| US-12140838-B2 | Barrier rib for image display device, manufacturing method therefor, and image display device comprising barrier rib | DONGWOO FINE-CHEM CO., LTD. (KR) | 2024-11-12 | — | — | US | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| WO-2024167161-A1 | COLORED PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE MANUFACTURED USING SAME | 동우 화인켐 주식회사 | 2024-08-15 | — | — | WO | disclosed |
| US-20100222526-A1 | METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100222526-A1 | METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6787289-B2 | OPTICS | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |