⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14003893 | 0.78 | — | — | |
| SCHEMBL958726 | 0.75 | ALDH1A1 (0.30) | — | |
| SCHEMBL108748 | 0.73 | — | — | |
| SCHEMBL331394 | 0.73 | — | — | |
| SCHEMBL331543 | 0.73 | — | — | |
| SCHEMBL28231285 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL160360 | 0.71 | ALDH1A1 (0.32) | — | |
| Alcohol SCHEMBL28150448 | 0.71 | ALDH1A1 (0.40) | — | |
| Alcohol SCHEMBL28302018 | 0.71 | ALDH1A1 (0.40) | — | |
| SCHEMBL13994665 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-11807758-B2 | Siloxane polymer and method of producing siloxane polymer | JNC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| CN-115943348-A | Resist underlayer film forming composition using diarylmethane derivative | 日产化学株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-115427891-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-12-02 | — | — | CN | disclosed |
| CN-115136074-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114830298-A | Composition for forming resist underlayer film for nanoimprinting | 日产化学株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114503032-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-114424121-A | Composition for forming resist underlayer film containing heterocyclic compound | 日产化学株式会社 | 2022-04-29 | — | — | CN | disclosed |
| CN-114174926-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| EP-2550281-B1 | SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2014-06-25 | — | — | EP | disclosed |
| US-8722914-B2 | Silaoxacycles | WACKER CHEMIE AG (DE) | 2014-05-13 | — | — | US | disclosed |
| US-8722914-B2 | Silaoxacycles | WACKER CHEMIE AG (DE) | 2014-05-13 | — | — | US | disclosed |
| US-8722914-B2 | Silaoxacycles | WACKER CHEMIE AG (DE) | 2014-05-13 | — | — | US | disclosed |
| US-20130204027-A1 | PRODUCTION OF SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2013-08-08 | — | — | US | disclosed |
| US-20130204027-A1 | PRODUCTION OF SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2013-08-08 | — | — | US | disclosed |
| US-20130204027-A1 | PRODUCTION OF SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2013-08-08 | — | — | US | disclosed |
| US-20130018200-A1 | SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2013-01-17 | — | — | US | disclosed |
| US-20130018200-A1 | SILAOXACYCLES | WACKER CHEMIE AG (DE) | 2013-01-17 | — | — | US | disclosed |
| WO-2011117071-A1 | SILAOXACYCLEN | WACKER CHEMIE AG (DE) | 2011-09-29 | — | — | WO | disclosed |