SCHEMBL24526475

SCHEMBL24526475

CCC(CC(C)(C)C)c1cccc2[nH]c3ccccc3c12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.43
ACHE P22303 1/20 0.43
IMPDH2 P12268 1/20 0.41
IMPDH1 P20839 1/20 0.41
UTS2R Q9UKP6 7/20 0.40
ADRB2 P07550 3/20 0.39
GABRP O00591 1/20 0.37
GABRD O14764 1/20 0.37
GABRA1 P14867 1/20 0.37
GABRB1 P18505 1/20 0.37
GABRG2 P18507 1/20 0.37
GABRB3 P28472 1/20 0.37
GABRA5 P31644 1/20 0.37
GABRA3 P34903 1/20 0.37
GABRA2 P47869 1/20 0.37
GABRB2 P47870 1/20 0.37
GABRA4 P48169 1/20 0.37
GABRE P78334 1/20 0.37
GABRA6 Q16445 1/20 0.37
GABRG1 Q8N1C3 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23846374 0.81 BCHE (0.43) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL9963708 0.77 BCHE (0.51) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL26458713 0.75 IMPDH2 (0.49) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL26229003 0.74 BCHE (0.48) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL20800181 0.73 IMPDH2 (0.53) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL27231678 0.70 IMPDH2 (0.50) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL27222030 0.70 IMPDH2 (0.50) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL22864072 0.69 ADRB2 (0.56) BCHEACHEIMPDH2IMPDH1ADRB2
SCHEMBL21939232 0.68 BCHE (0.48) BCHEACHEIMPDH2IMPDH1UTS2R
SCHEMBL23335809 0.68 BCHE (0.48) BCHEACHEIMPDH2IMPDH1UTS2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220197137-A1 PRE-WET LIQUID, RESIST FILM FORMING METHOD, PATTERN FORMING METHOD, AND KIT FUJIFILM CORPORATION (JP) 2022-06-23 US disclosed