SCHEMBL245325

SCHEMBL245325

C=C(C)C(=O)OCC#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1560869 0.81 TSHR (0.52)
SCHEMBL10718136 0.79
SCHEMBL892192 0.79
SCHEMBL33780 0.78 THRB (0.52)
SCHEMBL194435 0.77
Cyanate SCHEMBL28247590 0.76 ALDH1A1 (0.61)
SCHEMBL3902603 0.76 TSHR (0.47)
SCHEMBL10961656 0.76 TSHR (0.47)
SCHEMBL1562873 0.75
Water SCHEMBL1765013 0.75 THRB (0.71)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 335 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106661307-B Latex composition comprising the carboxyl acid modified copolymer emulsion based on nitrile and dip forming product prepared therefrom LG化学株式会社 2019-03-12 CN claimed
CN-109071885-A Latex composition for dip molding, and molded article prepared therefrom 株式会社LG化学 2018-12-21 CN claimed
CN-104521031-B Dividing plate and the electrochemical appliance including it LG化学株式会社 2017-07-11 CN claimed
CN-106661307-A Latex composition, containing carbonic acid modified nitrile copolymer latexes, for dip molding, and dip molded product manufactured therefrom LG化学株式会社 2017-05-10 CN claimed
CN-104521031-A Separator, and electrochemical device comprising same LG CHEMICAL LTD 2015-04-15 CN claimed
EP-2460863-B1 Self-adhesive base polymer for electro-luminescent masses TESA SE (DE) 2014-02-26 EP claimed
EP-2285928-B1 SELF-ADHESIVE BASE POLYMER FOR ELECTROLUMINESCENCE MASSES TESA SE (DE) 2011-11-23 EP claimed
US-7968083-B2 Methods of manufacturing deodorants, and deodorants resulting thereof THE HONG KONG POLYTECHNIC UNIVERSITY (CN) 2011-06-28 US claimed
US-20110074279-A1 SELF-ADHESIVE BASE POLYMER FOR ELECTROLUMINESCENCE MASSES TESA SE (DE) 2011-03-31 US claimed
US-20050232880-A1 Methods of manufacturing deodorants, and deodorants resulting thereof HONG KONG POLYTECHNIC UNIVERSITY, THE (CN) 2005-10-20 US claimed
US-6001549-A IMAGING ELEMENT CONTAINING ANTISTATIC AGENT EASTMAN KODAK COMPANY (US) 1999-12-14 US claimed
JP-58113933-A None JP disclosed
EP-4577585-B1 PHOSPHATE-CONTAINING EMULSION-BASED BINDER EVONIK OPERATIONS GMBH (DE) 2025-11-19 EP disclosed
US-12421170-B2 Granulate material and associated coating that is low in odor and emissions, particularly a construction element coating, for example a floor coating, based on a radical polymerization SIDEC NV (BE) 2025-09-23 US disclosed
EP-4577585-A1 PHOSPHATE-CONTAINING EMULSION-BASED BINDER Evonik Operations GmbH (DE) 2025-07-02 EP disclosed
JP-S58113933-A RESIST MATERIAL AND FORMATION OF RESIST MICROPATTERN USING IT DAIKIN IND LTD 1983-07-07 JP disclosed
US-4283504-A Crosslinkable polymers containing acrylamidophenol units EASTMAN KODAK COMPANY (US) 1981-08-11 US disclosed
US-4207109-A Element for photographic use containing crosslinkable polymers having acrylamidophenol units EASTMAN KODAK COMPANY (US) 1980-06-10 US disclosed
US-4156034-A COPOLYMER OF ACRYLIC ESTER AND STYRENE DERIVATIVE AS COATING AGENT HITACHI, LTD. (JP) 1979-05-22 US disclosed
US-4021397-A LATEX, HYDROXYLAMINE SULFATE THE B. F. GOODRICH COMPANY (US) 1977-05-03 US disclosed