SCHEMBL24533748

SCHEMBL24533748

CCC(C)(C(=O)OCc1ccccc1)C(=O)Oc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.47
MMP8 P22894 1/20 0.46
L3MBTL1 Q9Y468 3/20 0.44
ATM Q13315 1/20 0.44
LMNA P02545 1/20 0.43
KMT2A Q03164 3/20 0.42
MAPK1 P28482 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A3 Q01959 1/20 0.42
MEN1 O00255 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MAPT P10636 1/20 0.42
MAOB P27338 2/20 0.41
ELANE P08246 2/20 0.41
CYP3A4 P08684 1/20 0.40
TSHR P16473 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26453070 0.87 ELANE (0.50) MMP8L3MBTL1ATMTDP1MAPT
SCHEMBL25937757 0.78 ALDH1A1 (0.46) ALDH1A1MMP8L3MBTL1LMNAKMT2A
SCHEMBL116845 0.78 ALDH1A1 (0.56) ALDH1A1MMP8L3MBTL1LMNAKMT2A
SCHEMBL28003852 0.78 MMP8 (0.53) ALDH1A1MMP8L3MBTL1ATMSLC6A2
SCHEMBL11015123 0.78 ALDH1A1 (0.56) ALDH1A1MMP8L3MBTL1LMNAKMT2A
SCHEMBL19728229 0.77 KMT2A (0.47) ALDH1A1L3MBTL1LMNAKMT2AMAPK1
SCHEMBL638420 0.76 ALDH1A1 (0.55) ALDH1A1MMP8L3MBTL1LMNAKMT2A
SCHEMBL19105239 0.76 ALDH1A1 (0.58) ALDH1A1MMP8L3MBTL1LMNAKMT2A
SCHEMBL6108042 0.76 ALDH1A1 (0.58) ALDH1A1L3MBTL1LMNAKMT2AMAPK1
SCHEMBL991531 0.76 ALDH1A1 (0.62) ALDH1A1L3MBTL1LMNAKMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 US disclosed