SCHEMBL24533756

SCHEMBL24533756

CC(C)(O)c1ccc(OCC(COc2ccc(C(C)(C)O)cc2)(COc2ccc(C(C)(C)O)cc2)COc2ccc(C(C)(C)O)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HRH3 Q9Y5N1 1/20 0.49
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ CYP3A4 P08684 1/20 0.41
▸ PSMB1 P20618 2/20 0.40
▸ PSMB5 P28074 2/20 0.40
▸ PSMB2 P49721 2/20 0.40
▸ TP53 P04637 2/20 0.37
▸ MAPT P10636 2/20 0.37
▸ HPGD P15428 2/20 0.37
▸ TSHR P16473 2/20 0.37
▸ HIF1A Q16665 2/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ CYP1A2 P05177 1/20 0.37
▸ KMT2A Q03164 1/20 0.37
▸ APP P05067 1/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ PPARG P37231 1/20 0.37
▸ AOC3 Q16853 2/20 0.37
▸ MAOB P27338 1/20 0.37
▸ NR4A2 P43354 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24533755 0.88 HRH3 (0.49) HRH3SMN1; SMN2CYP3A4PSMB1PSMB5
SCHEMBL11547049 0.81 NQO1 (0.61) HRH3SMN1; SMN2MAPTTSHRALDH1A1
SCHEMBL24533728 0.79 HRH3 (0.61) HRH3SMN1; SMN2CYP3A4PSMB1PSMB5
SCHEMBL18905283 0.79 HRH3 (0.49) HRH3SMN1; SMN2CYP3A4PSMB1PSMB5
SCHEMBL24533749 0.79 HRH3 (0.32) HRH3MAPTALDH1A1
SCHEMBL19687568 0.78 SMN1; SMN2 (0.66) HRH3SMN1; SMN2CYP3A4PSMB1PSMB5
SCHEMBL9476152 0.78 HRH3 (0.59) HRH3SMN1; SMN2CYP3A4TP53TSHR
SCHEMBL24533712 0.78 HRH3 (0.55) HRH3SMN1; SMN2CYP3A4PSMB1PSMB5
SCHEMBL24533723 0.78 APP (0.61) HRH3APPMAOBNR4A2RXRA
SCHEMBL24533757 0.76 APP (0.50) HRH3HIF1ACYP1A2APPPPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
EP-4019489-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-29 — — EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 — — US disclosed
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