SCHEMBL24533723

SCHEMBL24533723

CC(C)(O)c1ccc(OCc2ccc(COc3ccc(C(C)(C)O)cc3)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ APP P05067 5/20 0.61
▸ RXRA P19793 2/20 0.58
▸ RXRB P28702 2/20 0.58
▸ NR4A2 P43354 1/20 0.58
▸ PTPRC P08575 1/20 0.53
▸ PTPN2 P17706 1/20 0.53
▸ PTPN1 P18031 1/20 0.53
▸ PTPRB P23467 1/20 0.53
▸ PTPN6 P29350 1/20 0.53
▸ CDC25A P30304 1/20 0.53
▸ PTPN11 Q06124 1/20 0.53
▸ MAOB P27338 6/20 0.53
▸ HRH3 Q9Y5N1 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31434400 0.91 MAOB (0.66) APPRXRARXRBNR4A2PTPRC
SCHEMBL4602365 0.91 LMNA (0.61) APPRXRARXRBNR4A2MAOB
SCHEMBL24533757 0.90 APP (0.50) APPRXRARXRBNR4A2PTPRC
SCHEMBL24533725 0.85 F2 (0.53) NR4A2PTPRCPTPN1MAOB
SCHEMBL31434412 0.84 MAOB (0.64) NR4A2MAOB
SCHEMBL22275947 0.83 APP (0.82) APPRXRARXRBNR4A2PTPRC
SCHEMBL18802918 0.82 APP (0.46) APPRXRARXRBNR4A2PTPRC
SCHEMBL9343512 0.81 TSHR (0.42) APPRXRARXRBNR4A2PTPN2
SCHEMBL9344511 0.81 TSHR (0.42) APPRXRARXRBNR4A2PTPN2
SCHEMBL14579981 0.81 APP (0.57) APPRXRARXRBNR4A2PTPRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 — — US disclosed
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