⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL960487 | 0.97 | — | — | |
| SCHEMBL11470209 | 0.74 | — | — | |
| SCHEMBL2359396 | 0.67 | — | — | |
| SCHEMBL964653 | 0.64 | AOC3 (0.32) | — | |
| Hydrochloric Acid SCHEMBL963459 | 0.62 | AOC3 (0.32) | — | |
| SCHEMBL13246634 | 0.62 | — | — | |
| SCHEMBL12332804 | 0.61 | KDM4E (0.31) | — | |
| SCHEMBL8628094 | 0.61 | — | — | |
| SCHEMBL16307583 | 0.59 | HTR7 (0.31) | — | |
| SCHEMBL8404556 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 349 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6696215-B2 | HIGH CONTRAST AND PHOTOSENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | claimed |
| US-20030232272-A1 | Silver halide photographic light sensitive material | FUJIFILM CORPORATION (JP) | 2003-12-18 | — | — | US | claimed |
| CN-110579936-B | Thermally developable photosensitive material and medical film using the same | 柯尼卡美能达株式会社 | 2023-10-27 | — | — | CN | disclosed |
| US-11384172-B2 | Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method | JSR CORPORATION (JP) | 2022-07-12 | — | — | US | disclosed |
| WO-2021099518-A1 | NOVEL COMPOUNDS FOR THE DIAGNOSIS, TREATMENT AND PREVENTION OF DISEASES ASSOCIATED WITH THE AGGREGATION OF ALPHA-SYNUCLEIN | MODAG GMBH (DE) | 2021-05-27 | — | — | WO | disclosed |
| CN-110579936-A | Heat-developable photosensitive material and medical film using the same | 柯尼卡美能达株式会社 | 2019-12-17 | — | — | CN | disclosed |
| US-20190284436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE | JSR CORPORATION (JP) | 2019-09-19 | — | — | US | disclosed |
| US-20190235376-A1 | THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| CN-109891316-A | Heat developing photo sensitive material and preparation method thereof | 富士胶片株式会社 | 2019-06-14 | — | — | CN | disclosed |
| US-9818962-B2 | Organic electroluminescent element and method for manufacturing same | Konica Minolta, Inc. (JP) | 2017-11-14 | — | — | US | disclosed |
| US-20170110677-A1 | ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING SAME | MERCK PATENT GMBH (DE) | 2017-04-20 | — | — | US | disclosed |
| US-20030203329-A1 | Silver halide photosensitive material | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| US-20030198905-A1 | Silver halide color photosensitive material | FUJI PHOTO FILM CO., LTD. | 2003-10-23 | — | — | US | disclosed |
| EP-1355190-A1 | Thermally developable photosensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030194638-A1 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1300726-A1 | Photothermographic material comprising fragmentable electron donor | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-4144391-A | REPLACING AN ACETOXY GROUP BY A SULFUR NUCLEOPHILE | ELI LILLY AND COMPANY (US) | 1979-03-13 | — | — | US | disclosed |
| US-3996217-A | BACTERICIDES | E. R. SQUIBB & SONS, INC. (US) | 1976-12-07 | — | — | US | disclosed |
| US-3994886-A | ANTIBACTERIAL | RECHERCHE ET INDUSTRIE THERAPEUTIQUES (R.I.T.) (BE) | 1976-11-30 | — | — | US | disclosed |
| US-3994887-A | ANTIBACTERIAL | RECHERCHE ET INDUSTRIE THERAPEUTIQUES (R.I.T.) (BE) | 1976-11-30 | — | — | US | disclosed |