SCHEMBL2460964

SCHEMBL2460964

CC1(C)CC(ON2C(C)(C)CCCC2(C)C)CC(C)(C)N1[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17907526 0.81 TSHR (0.32)
SCHEMBL3785749 0.81 ALDH1A1 (0.31)
SCHEMBL1232635 0.75 ACHE (0.32)
SCHEMBL6047075 0.73
SCHEMBL3453530 0.73
SCHEMBL6492 0.71 TSHR (0.39)
SCHEMBL50095 0.70
SCHEMBL10476584 0.69
SCHEMBL1232048 0.69 SLC6A4 (0.31)
SCHEMBL50428 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023128319-A1 CIGARETTE WRAPPER USING NANO-CELLULOSE FILM 주식회사 케이티앤지 2023-07-06 WO claimed
US-10711227-B2 TiN hard mask and etch residue removal VERSUM MATERIALS US, LLC (US) 2020-07-14 US claimed
US-20180251711-A1 TiN Hard Mask and Etch Residue Removal VERSUM MATERIALS US, LLC (US) 2018-09-06 US claimed
US-9976111-B2 TiN hard mask and etch residual removal VERSUM MATERIALS US, LLC (US) 2018-05-22 US claimed
US-20170107460-A1 TiN Hard Mask And Etch Residual Removal AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-04-20 US claimed
EP-3089200-A1 TITANIUM NITRIDE HARD MASK AND ETCH RESIDUE REMOVAL AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-11-02 EP claimed
US-9170250-B2 Oilfield chemicals with attached spin probes BAKER HUGHES INCORPORATED (US) 2015-10-27 US claimed
US-8377670-B2 Laccases for bio-bleaching VERENIUM CORPORATION (US) 2013-02-19 US claimed
US-20100043969-A1 METHOD FOR MOUNTING PRINTING PLATES TO PRINTING CYLINDERS OR SLEEVES WITH ADHESIVE TAPE TESA SE (DE) 2010-02-25 US claimed
US-20080044611-A1 Pressure Sensitive Adhesive Tape for the Adhesion of Printing Plates and Method for the Production Thereof TESA AG (DE) 2008-02-21 US claimed
US-6423846-B1 USING PHASE TRANSFER CATALYST HANMI PHARM. CO., LTD. (KR) 2002-07-23 US claimed
WO-2001012677-A1 METHOD OF INHIBITING VAPOR PHASE FOULING IN VINYL MONOMER SYSTEMS NALCO/EXXON ENERGY CHEMICALS, L.P. (US) 2001-02-22 WO claimed
EP-1077206-A1 Method of inhibiting vapor phase fouling in vinyl monomer systems NALCO/EXXON ENERGY CHEMICALS L.P. (US) 2001-02-21 EP claimed
WO-2023128319-A1 CIGARETTE WRAPPER USING NANO-CELLULOSE FILM 주식회사 케이티앤지 2023-07-06 WO disclosed
EP-3109703-B1 PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME TOKYO ELECTRON LTD (JP) 2020-12-30 EP disclosed
US-10711227-B2 TiN hard mask and etch residue removal VERSUM MATERIALS US, LLC (US) 2020-07-14 US disclosed
US-20060014944-A1 Processes for production of nucleosides AJINOMOTO CO., INC. (JP) 2006-01-19 US disclosed
EP-1589027-A1 PROCESSES FOR PRODUCTION OF NUCLEOSIDES Ajinomoto Co., Inc. (JP) 2005-10-26 EP disclosed
US-6423846-B1 USING PHASE TRANSFER CATALYST HANMI PHARM. CO., LTD. (KR) 2002-07-23 US disclosed
US-5712325-A Method for making radiation curable silicon containing polyacrylate hardcoat GENERAL ELECTRIC COMPANY (US) 1998-01-27 US disclosed