SCHEMBL2462848

SCHEMBL2462848

C=CC(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.46
ALDH1A1 P00352 4/20 0.46
TP53 P04637 3/20 0.46
HIF1A Q16665 3/20 0.46
CYP3A4 P08684 2/20 0.46
HSD17B10 Q99714 1/20 0.46
HPGD P15428 1/20 0.42
THRB P10828 3/20 0.39
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27085680 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1537033 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL347405 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL44451 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1536968 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2988873 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1536995 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL708916 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1286343 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1536868 1.00 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025103301-A1 COATING AND PREPARATION METHOD THEREFOR 江苏菲沃泰纳米科技股份有限公司 2025-05-22 WO claimed
US-20250011621-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2025-01-09 US claimed
US-12170189-B2 Coating apparatus and coating method JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2024-12-17 US claimed
EP-4421137-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-08-28 EP claimed
EP-4350031-A1 PLASMA POLYMERISATION COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-04-10 EP claimed
EP-3674438-B1 PREPARATION METHOD FOR HIGH INSULATION NANO-PROTECTIVE COATING HAVING MODULATION STRUCTURE JIANGSU FAVORED NANOTECHNOLOGY CO LTD (CN) 2023-03-29 EP claimed
WO-2022247633-A1 PLASMA POLYMERISATION COATING, PREPARATION METHOD, AND DEVICE 江苏菲沃泰纳米科技股份有限公司 2022-12-01 WO claimed
EP-3569733-B1 METHOD FOR PREPARING WATERPROOF AND ELECTRIC BREAKDOWN-RESISTANT COATING JIANGSU FAVORED NANOTECHNOLOGY CO LTD (CN) 2021-04-14 EP claimed
EP-3674438-A1 PREPARATION METHOD FOR HIGH INSULATION NANO-PROTECTIVE COATING HAVING MODULATION STRUCTURE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2020-07-01 EP claimed
EP-3569733-A1 METHOD FOR PREPARING WATERPROOF AND ELECTRIC BREAKDOWN-RESISTANT COATING Jiangsu Favored Nanotechnology Co., Ltd (CN) 2019-11-20 EP claimed
US-12531246-B2 Paste for secondary battery, slurry for secondary battery positive electrode, positive electrode for secondary battery, secondary battery, and method of producing paste for secondary battery ZEON CORPORATION (JP) 2026-01-20 US disclosed
EP-4644323-A9 SILICON-POLYMER COMPOSITE, PREPARATION METHOD THEREFOR, AND ANODE ACTIVE MATERIAL COMPRISING SAME Hanwha Solutions Corporation (KR) 2025-12-17 EP disclosed
US-12469852-B2 Paste for secondary battery, slurry for secondary battery positive electrode, positive electrode for secondary battery, secondary battery, and method of producing paste for secondary battery ZEON CORPORATION (JP) 2025-11-11 US disclosed
EP-4644322-A1 SILICON-CARBON COMPOSITE HAVING A YOLK-SHELL STRUCTURE, MANUFACTURING METHOD THEREFOR, AND NEGATIVE ELECTRODE ACTIVE MATERIAL COMPRISING SAME Hanwha Solutions Corporation (KR) 2025-11-05 EP disclosed
EP-4644323-A1 SILICON-POLYMER COMPOSITE, PREPARATION METHOD THEREFOR, AND ANODE ACTIVE MATERIAL COMPRISING SAME Hanwha Solutions Corporation (KR) 2025-11-05 EP disclosed
US-20050043458-A1 Process for manufacturing polymers ROHM AND HAAS COMPANY 2005-02-24 US disclosed
US-20050043453-A1 Process for manufacturing polymers CHANG CHING-JEN (US) 2005-02-24 US disclosed
EP-1439197-A1 Precision fragmentation assemblages and olefin polymerization catalysts made therefrom ROHM AND HAAS COMPANY (US) 2004-07-21 EP disclosed
US-6384104-B1 PROVIDING STORAGE STABILITY TO ULTRAVIOLET RADIATION ABSORPTION COMPOSITIONS BY ADDING LATEX POLYMER PARTICLES TO INCREASE ABSORPTION, WHEREIN PARTICLES CONTAIN VOID, HAVE SPECIFIED PARTICLE SIZE AND COMPRISE CROSSLINKED SHELL PORTION ROHM AND HAAS COMPANY 2002-05-07 US disclosed
EP-1092421-A2 Method for preparing ultraviolet radiation absorbing compositions ROHM AND HAAS COMPANY (US) 2001-04-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12531246-B2 Paste for secondary battery, slurry for secondary battery positive electrode, positive electrode for secondary battery, secondary battery, and method of producing paste for secondary battery TES, VAPB, HCN2 TSHR 2853/4885ALDH1A1 4101/4885TP53 2188/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.