Edoxaban

Edoxaban

SCHEMBL2464257

CN1CCc2nc(C(=O)N[C@@H]3C[C@@H](C(=O)N(C)C)CC[C@@H]3NC(=O)C(=O)Nc3ccc(Cl)cn3)sc2C1.O

nearest known ligand 0.99

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

F10

The experimentally established mechanism targets of Edoxaban. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
F10 known ✓ P00742 20/20 0.99
F2 P00734 2/20 0.99
F5 P12259 1/20 0.99
PLAT P00750 1/20 0.66

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Edoxaban SCHEMBL716662 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL1504007 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL715418 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL330046 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL16543780 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL713017 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL1312016 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL2125499 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL715737 0.99 F10 (1.00) F10F2F5PLAT
Edoxaban SCHEMBL12320151 0.99 F10 (1.00) F10F2F5PLAT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1405852-B9 DIAMINE DERIVATIVES DAIICHI SANKYO CO LTD (JP) 2013-03-27 EP claimed
EP-1405852-B1 DIAMINE DERIVATIVES DAIICHI SANKYO CO LTD (JP) 2012-08-01 EP claimed
WO-2011115066-A1 CRYSTAL OF DIAMINE DERIVATIVE AND METHOD OF PRODUCING SAME 第一三共株式会社 (JP) 2011-09-22 WO disclosed