SCHEMBL2464542

SCHEMBL2464542

C=CC[Si](C)(C)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23421962 0.85 TSHR (0.30)
SCHEMBL6361121 0.83 SMN1; SMN2 (0.31)
SCHEMBL8836112 0.83
SCHEMBL12908331 0.78
SCHEMBL236587 0.76
SCHEMBL6444905 0.76 TSHR (0.36)
SCHEMBL6062803 0.76
SCHEMBL10520356 0.74
SCHEMBL10524658 0.73
SCHEMBL1472601 0.72 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-63025646-A None JP disclosed
US-8697447-B2 Cleavable surfactants and methods of use thereof VANDERBILT UNIVERSITY (US) 2014-04-15 US disclosed
US-20110217783-A1 CLEAVABLE SURFACTANTS AND METHODS OF USE THEREOF VANDERBILT UNIVERSITY 2011-09-08 US disclosed
EP-1404643-A4 CLEAVABLE SURFACTANTS AND METHODS OF USE THEREOF UNIV VANDERBILT (US) 2008-05-07 EP disclosed
US-20060240562-A1 CLEAVABLE SURFACTANTS AND METHODS OF USE THEREOF CAPRIOLI RICHARD M 2006-10-26 US disclosed
US-7074936-B2 Cleavable surfactants and methods of use thereof VANDERBILT UNIVERSITY (US) 2006-07-11 US disclosed
US-20040152913-A1 Cleavable surfactants and methods of use thereof VANDERBILT UNIVERSITY 2004-08-05 US disclosed
EP-1404643-A2 CLEAVABLE SURFACTANTS AND METHODS OF USE THEREOF VANDERBILT UNIVERSITY (US) 2004-04-07 EP disclosed
WO-2002097393-A2 CLEAVABLE SURFACTANTS AND METHODS OF USE THEREOF VANDERBILT UNIVERSITY (US) 2002-12-05 WO disclosed
US-4804612-A PLASMA DRY-ETCHING RESISTANCE TOKYO OHKA KOGYO CO., LTD. (JP) 1989-02-14 US disclosed
US-4804612-A PLASMA DRY-ETCHING RESISTANCE TOKYO OHKA KOGYO CO., LTD. (JP) 1989-02-14 US disclosed
JP-S6325646-A POSITIVE TYPE PHOTORESIST COMPOSITION HAVING HIGH HEAT RESISTANCE TOKYO OHKA KOGYO CO LTD 1988-02-03 JP disclosed
JP-S06325646-A 0001-01-01 JP disclosed