Acrylic Acid

Acrylic Acid

SCHEMBL2465764

C=CC(=O)O.S

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL29865021 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL2686480 1.00
Acrylic Acid SCHEMBL28266050 1.00 LMNA (0.91)
Acrylic Acid SCHEMBL5881311 0.96
Acrylic Acid SCHEMBL11652408 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL5065665 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL8085498 0.95
Acrylic Acid SCHEMBL8580358 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL7706117 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL119206 0.95 LMNA (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107109107-A Electroconductive polymer coating for three-dimensional substrates 碧奥蒂克提克斯有限责任公司 2017-08-29 CN claimed
EP-0683174-B1 Thioether containing photopolymerizable compositions EASTMAN KODAK CO (US) 1998-08-05 EP claimed
EP-0550295-B1 Process for the preparation of paper and paper laminates. RHODIA CHIMIE SA (FR) 1998-05-27 EP claimed
US-5532286-A BONDING STRENGTH EASTMAN KODAK COMPANY (US) 1996-07-02 US claimed
US-5518789-A ACRYLIC ESTER OR AMIDE, OPTICAL RECORDING EASTMAN KODAK COMPANY (US) 1996-05-21 US claimed
EP-0683174-A2 Thioether containing photopolymerizable compositions EASTMAN KODAK COMPANY (US) 1995-11-22 EP claimed
US-4431782-A Process for the preparation of radiation-curable, water-thinnable vinyl ester resins THE DOW CHEMICAL COMPANY (US) 1984-02-14 US claimed
US-4338232-A Radiation-curable resins THE DOW CHEMICAL COMPANY (US) 1982-07-06 US claimed
JP-7320299-A None JP disclosed
CN-114929455-B Inkjet method for producing spectacle lenses 卡尔蔡司光学国际有限公司 2024-06-14 CN disclosed
CN-115197109-B Method for preparing methyl 3-mercaptopropionate 大连九信精细化工有限公司 2024-02-20 CN disclosed
CN-117447369-A Synthesis method of 3-mercaptopropionic acid 益丰新材料股份有限公司 2024-01-26 CN disclosed
CN-112250866-B Preparation method of free radical type photocuring resin with thioether as main chain 江汉大学 2023-04-07 CN disclosed
CN-112409227-B Method for efficiently synthesizing 3-mercaptopropionic acid 益丰新材料股份有限公司 2023-01-20 CN disclosed
JP-H07320299-A THIOETHER-CONTAINING PHOTOPOLYMERIZABLE COMPOSITION EASTMAN KODAK CO 1995-12-08 JP disclosed
EP-0683174-A2 Thioether containing photopolymerizable compositions EASTMAN KODAK COMPANY (US) 1995-11-22 EP disclosed
US-5008432-A Reacting olefinically unsaturated compounds such as esters, acids, ketones, nitriles, carbamates, nitro and sulfoxides with hydrogen sulfide in presence of magnesium oxide catalyst PHILLIPS PETROLEUM COMPANY (US) 1991-04-16 US disclosed
US-4999136-A Electroconductive adhesive, acrylated epoxy resin and urethane WESTINGHOUSE ELECTRIC CORP. (US) 1991-03-12 US disclosed
US-4885355-A Water-insoluble polymers from cyclic sulfonium compounds THE DOW CHEMICAL COMPANY (US) 1989-12-05 US disclosed
US-4797456-A Aqueous-dispersible cyclic sulfonium compounds that cure to form water-insoluble polymers THE DOW CHEMICAL COMPANY (US) 1989-01-10 US disclosed