SCHEMBL2467241

SCHEMBL2467241

CC(O)Oc1cccc(O)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.55
CHRNB4 P30926 2/20 0.50
CHRNA3 P32297 2/20 0.50
ESR1 P03372 2/20 0.45
ESR2 Q92731 2/20 0.45
CHRNB2 P17787 1/20 0.44
CHRNA4 P43681 1/20 0.44
ADRB1 P08588 1/20 0.44
MIF P14174 1/20 0.44
HTR2A P28223 1/20 0.44
ADRA1A P35348 1/20 0.44
HTR2B P41595 1/20 0.44
LMNA P02545 2/20 0.44
CA12 O43570 1/20 0.44
ALDH1A1 P00352 1/20 0.44
CA2 P00918 1/20 0.44
CA5A P35218 1/20 0.44
CA9 Q16790 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CA14 Q9ULX7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31314901 1.00 CYP3A4 (0.55) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL2319401 0.87 MTNR1A (0.43) LMNAALDH1A1ACHEHIF1AKDM4E
Resorcinol SCHEMBL4366925 0.86 CYP3A4 (0.44) CYP3A4CHRNB4CHRNA3ESR1CHRNB2
Resorcinol SCHEMBL4366924 0.86 LMNA (0.44) CYP3A4CHRNB4CHRNA3ESR1CHRNB2
SCHEMBL105731 0.85 CYP3A4 (0.62) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL8697795 0.85 CYP3A4 (0.57) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL30398332 0.85 CYP3A4 (0.62) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL16902843 0.85 CYP3A4 (0.57) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL9987948 0.84 CYP3A4 (0.52) CYP3A4CHRNB4CHRNA3ESR1ESR2
SCHEMBL10962952 0.83 CYP3A4 (0.53) CYP3A4CHRNB4CHRNA3ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107852786-B Circularly polarizing plate for organic EL display device and organic EL display device 日东电工株式会社 2021-05-11 CN disclosed
CN-107852786-A Organic EL display circular polarizing disk and organic EL display 日东电工株式会社 2018-03-27 CN disclosed
EP-1918317-B1 Composite material containing non-functional aromatic end group-containing polymer ROHM & HAAS (US) 2011-09-14 EP disclosed
US-7612145-B2 Composite material containing non-functional aromatic end group-containing polymer ROHM AND HAAS COMPANY (US) 2009-11-03 US disclosed
EP-1298490-B1 Photopolymerizable composition and recording material FUJIFILM CORP (JP) 2008-08-13 EP disclosed
US-7399569-B2 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJIFILM CORPORATION (JP) 2008-07-15 US disclosed
EP-1918317-A2 Composite material containing non-functional aromatic end group-containing polymer Rohm and Haas Company (US) 2008-05-07 EP disclosed
US-20080078976-A1 Composite material containing non-functional aromatic end group-containing polymer ROHM AND HAAS COMPANY 2008-04-03 US disclosed
US-7220529-B2 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2007-05-22 US disclosed
EP-1254780-B1 Recording material FUJI PHOTO FILM CO LTD (JP) 2007-01-03 EP disclosed
US-5376495-A Microcapsules from solution containing component capable of undergoing color development or achromatization and volatile solvent FUJI PHOTO FILM CO., LTD. (JP) 1994-12-27 US disclosed
EP-0611077-A2 Polyurethane elastomer blends ROHM AND HAAS COMPANY (US) 1994-08-17 EP disclosed
EP-0605736-A1 POLYOXYMETHYLENE COMPOSITION POLYPLASTICS CO. LTD. (JP) 1994-07-13 EP disclosed
US-5183860-A Blend with thermoplastic polyurethane POLYPLASTICS CO., LTD. (JP) 1993-02-02 US disclosed
US-5091280-A Photothermography; microencapsulated leuco dyes, polymerizable vinyl monomer, photoinitiator electron acceptive developer FUJI PHOTO FILM CO., LTD. (JP) 1992-02-25 US disclosed
EP-0449605-A2 Polyacetal resin composition POLYPLASTICS CO. LTD. (JP) 1991-10-02 EP disclosed
EP-0412570-A2 Light- and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1991-02-13 EP disclosed
US-4929712-A MELT KNEADING THERMOPLASTIC POLYURETHANE, BLENDS, POLYISOCYANATE, POLYISOTHICCYANATE COMPOUNDS POLYPLASTICS CO., LTD. (JP) 1990-05-29 US disclosed
EP-0350223-A2 Polyacetal resin composition POLYPLASTICS CO. LTD. (JP) 1990-01-10 EP disclosed
US-4374974-A METHYLENE CHLORIDE AND AROMATIC DIHYDROXIDE TO PRODUCE LINEAR AND CYCLIC POLYMERS FOR USE AS FILMS GENERAL ELECTRIC COMPANY (US) 1983-02-22 US disclosed