⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533040 | 0.82 | TSHR (0.32) | — | |
| SCHEMBL543762 | 0.80 | TSHR (0.30) | — | |
| SCHEMBL64586 | 0.79 | TSHR (0.31) | — | |
| SCHEMBL15856573 | 0.77 | — | — | |
| SCHEMBL1018060 | 0.75 | — | — | |
| SCHEMBL448711 | 0.73 | — | — | |
| SCHEMBL62589 | 0.73 | — | — | |
| SCHEMBL28760990 | 0.73 | — | — | |
| SCHEMBL26086446 | 0.73 | — | — | |
| SCHEMBL248018 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2080774-B1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORP (JP) | 2014-01-15 | — | — | EP | claimed |
| US-7956142-B2 | Polymerizable sulfonic acid onium salt and resin | JSR CORPORATION (JP) | 2011-06-07 | — | — | US | claimed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | claimed |
| EP-2080774-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR Corporation (JP) | 2009-07-22 | — | — | EP | claimed |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250334881-A1 | RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RADIATION SENSITIVE ACID GENERATOR, AND ACID DIFFUSION CONTROL AGENT | JSR CORPORATION (JP) | 2025-10-30 | — | — | US | disclosed |
| US-20250271756-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250271762-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250271761-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| WO-2025070119-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND | JSR株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-20250076760-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-03-06 | — | — | US | disclosed |
| WO-2024181434-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATION AGENT | JSR株式会社 | 2024-09-06 | — | — | WO | disclosed |
| US-20100040977-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2088467-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-08-12 | — | — | EP | disclosed |
| EP-2088467-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-7569324-B2 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| EP-2080774-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR Corporation (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2080774-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR Corporation (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |