Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL543762 | 0.97 | TSHR (0.30) | TSHR | |
| SCHEMBL246920 | 0.82 | — | — | |
| SCHEMBL3929610 | 0.77 | — | — | |
| SCHEMBL27785024 | 0.77 | SMN1; SMN2 (0.33) | TSHRSMN1; SMN2 | |
| SCHEMBL338407 | 0.77 | SMN1; SMN2 (0.33) | TSHRSMN1; SMN2 | |
| SCHEMBL14732305 | 0.74 | SMN1; SMN2 (0.32) | TSHRSMN1; SMN2 | |
| SCHEMBL864384 | 0.74 | SMN1; SMN2 (0.32) | TSHRSMN1; SMN2 | |
| SCHEMBL14763324 | 0.74 | — | — | |
| SCHEMBL10333533 | 0.74 | SMN1; SMN2 (0.32) | TSHRSMN1; SMN2 | |
| SCHEMBL12589634 | 0.72 | SMN1; SMN2 (0.36) | TSHRSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11592746-B2 | Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid | JSR CORPORATION (JP) | 2023-02-28 | — | — | US | disclosed |
| US-20200341376-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID | JSR CORPORATION (JP) | 2020-10-29 | — | — | US | disclosed |
| CN-104570600-B | Coloring composition, colored cured film, and display element | JSR株式会社 | 2020-08-25 | — | — | CN | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7812105-B2 | Compound, polymer, and radiation-sensitive composition | JSR CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-7812105-B2 | Compound, polymer, and radiation-sensitive composition | JSR CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | JSR CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | JSR CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| EP-1897869-A1 | NOVEL COMPOUND, POLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-03-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | TSHR 890/4885SMN1; SMN2 1699/4885 |
| US-20090069521-A1 | Novel Compound, Polymer, and Radiation-Sensitive Composition | MRE11, RAD51, MRPS22 | TSHR 2355/4885SMN1; SMN2 1360/4885 |
| US-20200341376-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID | RER1, TAS1R1, RAD51 | TSHR 247/4885SMN1; SMN2 3147/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | TSHR 1269/4885SMN1; SMN2 2668/4885 |
| US-11592746-B2 | Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid | RER1, TAS1R1, RAD51 | TSHR 247/4885SMN1; SMN2 3147/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.