SCHEMBL24711012

SCHEMBL24711012

N#CC(C#N)=Cc1ccc(C(=O)OI)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.59
▸ KDM4E B2RXH2 9/20 0.59
▸ ALDH1A1 P00352 9/20 0.59
▸ MEN1 O00255 7/20 0.59
▸ KMT2A Q03164 7/20 0.59
▸ LMNA P02545 3/20 0.59
▸ NPSR1 Q6W5P4 2/20 0.59
▸ POLB P06746 1/20 0.59
▸ EGFR P00533 4/20 0.55
▸ THRB P10828 1/20 0.52
▸ CISD1 Q9NZ45 1/20 0.52
▸ NFKB1 P19838 3/20 0.50
▸ CYP1A2 P05177 2/20 0.50
▸ CYP3A4 P08684 2/20 0.50
▸ HPGD P15428 2/20 0.50
▸ TSHR P16473 2/20 0.50
▸ BLM P54132 2/20 0.50
▸ PMP22 Q01453 2/20 0.50
▸ APEX1 P27695 1/20 0.50
▸ SMN1; SMN2 Q16637 6/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6841774 0.83 ALDH1A1 (0.59) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL4910895 0.78 MAPT (0.68) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL4910902 0.78 ALDH1A1 (0.68) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL17466932 0.77 MAPT (1.00) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL8588438 0.77 ALDH1A1 (0.65) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL5570254 0.77 MAPT (0.65) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL8588440 0.75 MAPT (0.63) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL9152418 0.74 MAPT (0.65) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL24711011 0.74 MAPT (0.68) MAPTKDM4EALDH1A1MEN1KMT2A
SCHEMBL24710420 0.74 MAPT (0.47) MAPTKDM4EALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220397828-A1 COMPOSITION CONTAINING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED NISSAN CHEMICAL CORPORATION (JP) 2022-12-15 — — US disclosed
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