Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.36 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1069284 | 0.92 | LMNA (0.55) | MGLLLMNAPOLBALDH1A1NPSR1 | |
| SCHEMBL1069285 | 0.92 | LMNA (0.55) | MGLLLMNAPOLBALDH1A1NPSR1 | |
| SCHEMBL157947 | 0.85 | MGLL (0.50) | MGLLALDH1A1TP53CYP3A4GSTP1 | |
| SCHEMBL29384631 | 0.85 | MGLL (0.50) | MGLLALDH1A1TP53CYP3A4GSTP1 | |
| SCHEMBL157948 | 0.85 | MGLL (0.50) | MGLLALDH1A1TP53CYP3A4GSTP1 | |
| SCHEMBL246725 | 0.83 | ATM (0.35) | MGLLLMNAPOLBALDH1A1GSTP1 | |
| SCHEMBL8416322 | 0.80 | LMNA (0.62) | MGLLLMNAPOLBALDH1A1NPSR1 | |
| SCHEMBL8419580 | 0.80 | LMNA (0.62) | MGLLLMNAPOLBALDH1A1NPSR1 | |
| SCHEMBL8416318 | 0.80 | LMNA (0.62) | MGLLLMNAPOLBALDH1A1NPSR1 | |
| SCHEMBL154822 | 0.79 | LMNA (0.44) | MGLLLMNAPOLBALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103969950-B | Photosensitive composition | 东友精细化工有限公司 | 2018-03-20 | — | — | CN | disclosed |
| US-20120002138-A1 | Pattern forming ink composition, light guide plate, light emitting unit and liquid crystal display element having the light emitting unit | CHI-MEI CORPORATION | 2012-01-05 | — | — | US | disclosed |
| US-7338737-B2 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-04 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-7297452-B2 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20070254221-A1 | Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. | SAMSUNG DISPLAY CO., LTD. (KR) | 2007-11-01 | — | — | US | disclosed |
| US-20070112106-A1 | Photosensitive resin composition | NIPPON SHOKUBAI CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |