⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malonic Acid SCHEMBL11307216 | 0.95 | — | — | |
| Malonic Acid SCHEMBL28221810 | 0.95 | LDHA (1.00) | — | |
| Malonic Acid SCHEMBL1332554 | 0.95 | — | — | |
| Malonic Acid SCHEMBL3358611 | 0.95 | — | — | |
| Malonic Acid SCHEMBL1332405 | 0.95 | — | — | |
| Malonic Acid SCHEMBL23831 | 0.95 | LDHA (1.00) | — | |
| Malonic Acid SCHEMBL336 | 0.95 | — | — | |
| Malonic Acid SCHEMBL1332587 | 0.95 | — | — | |
| Malonic Acid SCHEMBL21815640 | 0.90 | — | — | |
| Malonic Acid SCHEMBL21815791 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114855152-A | Environment-friendly iron-based phosphorus-free film treatment composition and treatment agent for metal surface, and preparation method and application of treatment agent | 许昌学院 | 2022-08-05 | — | — | CN | claimed |
| US-12617973-B2 | Slurry compositions for polishing metal layers, chemical mechanical polishing apparatuses using the same, and methods for fabricating semiconductor devices using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-05 | — | — | US | disclosed |
| EP-3744427-B1 | PROCESS AND APPARATUS FOR THE TREATMENT OF GAS STREAMS CONTAINING NITROGEN OXIDES | BASF SE (DE) | 2026-01-28 | — | — | EP | disclosed |
| US-12534640-B2 | Polishing liquid and polishing method | RESONAC CORPORATION (JP) | 2026-01-27 | — | — | US | disclosed |
| US-12491502-B2 | Preparation of SCR catalyst comprising Cu and Fe-exchanged zeolite, said catalyst, system comprising said catalyst and exhaust gas treatment using such | BASF CORPORATION (US) | 2025-12-09 | — | — | US | disclosed |
| US-12476114-B2 | Chemical mechanical polishing method and method for fabricating semiconductor device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-11-18 | — | — | US | disclosed |
| EP-3873649-B1 | EXHAUST TREATMENT SYSTEM FOR A LEAN BURN ENGINE | BASF MOBILE EMISSIONS CATALYSTS LLC (US) | 2025-09-17 | — | — | EP | disclosed |
| US-20250257242-A1 | CMP POLISHING LIQUID AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12378438-B2 | Polishing solution, dispersion, polishing solution production method, and polishing method | RESONAC CORPORATION (JP) | 2025-08-05 | — | — | US | disclosed |
| US-12372020-B2 | Preparation of SCR catalyst comprising Cu and Fe-exchanged zeolite, said catalyst, system comprising said catalyst and exhaust gas treatment using such | BASF CORPORATION (US) | 2025-07-29 | — | — | US | disclosed |
| US-20100314576-A1 | COMPOSITIONS FOR CMP OF SEMICONDUCTOR MATERIALS | CABOT MICROELECTRONICS CORPORATION | 2010-12-16 | — | — | US | disclosed |
| US-7803203-B2 | Compositions and methods for CMP of semiconductor materials | CABOT MICROELECTRONICS CORPORATION (US) | 2010-09-28 | — | — | US | disclosed |
| CN-101506325-A | Compositions and methods for cmp of semiconductor materials | CABOT MICROELECTRONICS CORP (US) | 2009-08-12 | — | — | CN | disclosed |
| WO-2008027421-A1 | COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS | CABOT MICROELECTRONICS CORPORATION (US) | 2008-03-06 | — | — | WO | disclosed |
| US-20070181535-A1 | COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS | CABOT MICROELECTRONICS CORPORATION (US) | 2007-08-09 | — | — | US | disclosed |
| CN-1306560-A | CMP slurry containing solid catalyst | CABOT MICROELECTRONIC CORP (US) | 2001-08-01 | — | — | CN | disclosed |
| US-4673439-A | MIXTURE OF REACTION MALEIC ANHYDRIDE AND OLEFIN WITH EMULSIFI ER | MITSUBISHI OIL CO., LTD. (JP) | 1987-06-16 | — | — | US | disclosed |
| EP-0108624-B1 | PROCESS FOR THE PRODUCTION OF P-VINYL PHENOL POLYMER | MARUZEN OIL CO., LTD. (JP) | 1986-02-19 | — | — | EP | disclosed |
| US-4517349-A | MOLECULAR ERIGHT CONTROL | MARUZEN OIL COMPANY, LIMITED (JP) | 1985-05-14 | — | — | US | disclosed |
| EP-0108624-A1 | Process for the production of p-vinyl phenol polymer | MARUZEN OIL CO., LTD. (JP) | 1984-05-16 | — | — | EP | disclosed |