Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2349829 | 0.85 | — | — | |
| SCHEMBL1206903 | 0.82 | CYP2D6 (0.36) | CYP2D6CYP2C19 | |
| SCHEMBL23694120 | 0.76 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL18772329 | 0.76 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL75012 | 0.76 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL14859877 | 0.74 | CYP2D6 (0.31) | CYP2D6CYP2C19 | |
| SCHEMBL2805726 | 0.72 | CYP2C19 (0.31) | CYP2D6CYP2C19 | |
| SCHEMBL14860279 | 0.72 | CYP2D6 (0.30) | CYP2D6CYP2C19 | |
| Maleic Anhydride SCHEMBL6318484 | 0.71 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL14142588 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130095425-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-18 | — | — | US | disclosed |
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | disclosed |
| US-6642336-B1 | Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-11-04 | — | — | US | disclosed |
| US-6596459-B1 | Photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-22 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |