SCHEMBL2805726

SCHEMBL2805726

CC1CCC(C(C)(C)C2(C(=O)O)CC3C=CC2C3)CC1

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14860279 0.89 CYP2D6 (0.30) CYP2C19CYP2D6
SCHEMBL14859877 0.87 CYP2D6 (0.31) CYP2C19CYP2D6
SCHEMBL14142588 0.84
SCHEMBL1206903 0.79 CYP2D6 (0.36) CYP2C19CYP2D6
SCHEMBL75012 0.72 CYP2C19 (0.33) CYP2C19CYP2C9CYP2D6
Maleic Anhydride SCHEMBL6318484 0.69 CYP2D6 (0.32) CYP2C19CYP2D6
SCHEMBL2805725 0.69 CYP2C9 (0.30) CYP2C19CYP2C9
SCHEMBL4559028 0.68
SCHEMBL6403313 0.68 KDM4E (0.38)
SCHEMBL6910164 0.66 CYP2D6 (0.33) CYP2C19CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10795258-B2 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-10-06 US disclosed
US-20130095425-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-18 US disclosed
US-20100304292-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMMPANY, LIMITED (JP) 2010-12-02 US disclosed
US-7786322-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-08-31 US disclosed
US-20070122750-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070122750-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same HCN3, NHERF1, HCN4 CYP2C19 951/4885CYP2C9 1141/4885CYP2D6 2136/4885
US-20100304292-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME CRY1, CHRM1, C1S CYP2C19 2085/4885CYP2C9 2366/4885CYP2D6 1210/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.