Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23694120 | 1.00 | CYP2C19 (0.33) | CYP2C19CYP2D6HTTLMNACYP3A4 | |
| SCHEMBL18772329 | 1.00 | CYP2C19 (0.33) | CYP2C19CYP2D6HTTLMNACYP3A4 | |
| SCHEMBL13525789 | 0.84 | CYP2C19 (0.35) | CYP2C19CYP2D6HTTLMNACYP3A4 | |
| SCHEMBL16894040 | 0.83 | CYP2D6 (0.34) | CYP2C19CYP2D6 | |
| SCHEMBL1206903 | 0.82 | CYP2D6 (0.36) | CYP2C19CYP2D6 | |
| SCHEMBL14567551 | 0.80 | CYP2C19 (0.33) | CYP2C19CYP2D6HTTLMNACYP3A4 | |
| SCHEMBL24221420 | 0.78 | — | — | |
| SCHEMBL2382567 | 0.78 | CYP2D6 (0.31) | CYP2C19CYP2D6 | |
| SCHEMBL13744383 | 0.77 | ABHD6 (0.32) | — | |
| SCHEMBL13744776 | 0.77 | HTT (0.32) | CYP2C19CYP2D6HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 276 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| US-7045582-B2 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2006-05-16 | — | — | US | disclosed |
| US-20060068324-A1 | Positive photosensitive resin and novel dithiol compound | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2006-03-30 | — | — | US | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20060058433-A1 | Method for prevention of increase in particles in copolymer for semiconductor resist | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050287474-A1 | Resist polymer and method for producing the polymer | YAMAGISHI TAKANORI | 2005-12-29 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20050131184-A1 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050096447-A1 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20040181023-A1 | Novel thiol compound, copolymer and method for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| US-20040167298-A1 | suitable for fine pattern formation in the semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | INSR, INSRR, SLC6A5 | CYP2C19 4784/4885CYP2D6 4375/4885HTT 1252/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | CYP2C19 4159/4885CYP2D6 2665/4885HTT 153/4885 |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | CYP2C19 2474/4885CYP2D6 3399/4885HTT 4398/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.