Acrylic Acid

Acrylic Acid

SCHEMBL2476702

C=CC(=O)O.C=CCC(C)OC(N)=O

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.44
TSHR P16473 3/20 0.44
CHRM2 P08172 1/20 0.44
CHRM4 P08173 1/20 0.44
CHRM5 P08912 1/20 0.44
CHRM1 P11229 1/20 0.44
CHRM3 P20309 1/20 0.44
CYP2C9 P11712 1/20 0.44
MAPT P10636 1/20 0.43
GRIK1 P39086 2/20 0.34
GRIK2 Q13002 2/20 0.34
ALDH1A1 P00352 1/20 0.31
FGFR4 P22455 1/20 0.31
ALOX15 P16050 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HCAR2 Q8TDS4 1/20 0.31
CYP2C19 P33261 1/20 0.30
CPA1 P15085 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL87648 0.92
SCHEMBL27746027 0.89 TSHR (0.44) LMNATSHRCHRM2CHRM4CHRM5
Methacrylic Acid SCHEMBL2475286 0.86 LMNA (0.42) LMNATSHRCHRM2CHRM4CHRM5
SCHEMBL766966 0.78
Acrylic Acid SCHEMBL27387155 0.78 LMNA (0.46) LMNATSHRCHRM2CHRM4CHRM5
Acrylic Acid SCHEMBL29278911 0.77 TSHR (0.41) LMNATSHRCHRM2CHRM4CHRM5
Acrylic Acid SCHEMBL28012083 0.76 LMNA (0.43) LMNATSHRCHRM2CHRM4CHRM5
SCHEMBL9246267 0.76 TSHR (0.35) LMNATSHRCHRM2CHRM4CHRM5
SCHEMBL766965 0.76 TSHR (0.35) LMNATSHRCHRM2CHRM4CHRM5
Acrylic Acid SCHEMBL27489502 0.75 FAAH (0.48) LMNATSHRCHRM2CHRM4CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2142578-A1 THERMOSETTING RESIN COMPOSITION Scott Bader Company Limited (GB) 2010-01-13 EP claimed
WO-2008119973-A1 THERMOSETTING RESIN COMPOSITION SCOTT BADER COMPANY LIMITED (GB) 2008-10-09 WO claimed
US-9181380-B2 Thermosetting resin composition PANTHER RICHARD AUSTIN (GB) 2015-11-10 US disclosed
EP-2373718-B1 GELCOAT COMPOSITION AND ARTICLES COMPRISING THE SAME SCOTT BADER CO (GB) 2014-08-13 EP disclosed
EP-2647651-A1 Thermosetting resin composition Scott Bader Company Limited (GB) 2013-10-09 EP disclosed
EP-2142578-B1 THERMOSETTING RESIN COMPOSITION SCOTT BADER CO (GB) 2013-07-10 EP disclosed
US-20110262755-A1 Gelcoat Composition and Articles Comprising the Same SCOTT BADER COMPANY LIMITED (GB) 2011-10-27 US disclosed
EP-2373718-A1 GELCOAT COMPOSITION AND ARTICLES COMPRISING THE SAME Scott Bader Company Limited (GB) 2011-10-12 EP disclosed
WO-2010073003-A1 GELCOAT COMPOSITION AND ARTICLES COMPRISING THE SAME SCOTT BADER COMPANY LIMITED (GB) 2010-07-01 WO disclosed
US-20100130675-A1 THERMOSETTING RESIN COMPOSITION PANTHER RICHARD AUSTIN 2010-05-27 US disclosed
EP-2142578-A1 THERMOSETTING RESIN COMPOSITION Scott Bader Company Limited (GB) 2010-01-13 EP disclosed
US-5880171-A A FREE RADICAL POLYMERIZABLE MONOMERS COMPRISE AN EPOXY OLIGOMER END TERMINATED WITH ACRYLATE OR METHACRYLATE, A DILUENT CONTAINING AN ACRYLIC OR METHACRYLIC ESTER OF HYDROCARBON DIOL AND AN ALKOXYLATED ACRYLATE OR POLYACRYLATE 2C OPTICS, INC. (US) 1999-03-09 US disclosed
US-5849411-A Polymer film, nonwoven web and fibers containing a photoreactor composition KIMBERLY-CLARK WORLDWIDE, INC. (US) 1998-12-15 US disclosed
US-5811199-A Adhesive compositions containing a photoreactor composition KIMBERLY-CLARK WORLDWIDE, INC. (US) 1998-09-22 US disclosed
US-5798015-A Method of laminating a structure with adhesive containing a photoreactor composition KIMBERLY-CLARK WORLDWIDE, INC. (US) 1998-08-25 US disclosed
EP-0636064-A4 LENSES WITH HIGH IMPACT RESISTANCE AND HIGH SCRATCH RESISTANCE. SOANE TECHNOLOGIES INC (US) 1998-07-01 EP disclosed
US-5747550-A Method of generating a reactive species and polymerizing an unsaturated polymerizable material KIMBERLY-CLARK WORLDWIDE, INC. (US) 1998-05-05 US disclosed
US-5739175-A Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer KIMBERLY-CLARK WORLDWIDE, INC. (US) 1998-04-14 US disclosed
EP-0636064-A1 LENSES WITH HIGH IMPACT RESISTANCE AND HIGH SCRATCH RESISTANCE SOANE TECHNOLOGIES INC. (US) 1995-02-01 EP disclosed
WO-1993021010-A1 LENSES WITH HIGH IMPACT RESISTANCE AND HIGH SCRATCH RESISTANCE SOANE TECHNOLOGIES, INC. (US) 1993-10-28 WO disclosed