SCHEMBL2480581

SCHEMBL2480581

O=C(/C=C\C(=O)OC(=O)C1=CC2CCC1C2)OC(=O)C1=CC2CCC1C2

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL601985 0.88 CYP19A1 (0.38) CYP19A1
SCHEMBL996860 0.77 SLC6A3 (0.40) CYP19A1
SCHEMBL29723671 0.77 SLC6A3 (0.40) CYP19A1
SCHEMBL29723645 0.77 SLC6A3 (0.40) CYP19A1
SCHEMBL31064743 0.77 SLC6A3 (0.40) CYP19A1
SCHEMBL7741611 0.77 CYP19A1 (0.36) CYP19A1
SCHEMBL11511271 0.77 CYP19A1 (0.34) CYP19A1
SCHEMBL4080277 0.75 CYP19A1 (0.38) CYP19A1
SCHEMBL4247813 0.73 TSHR (0.38) CYP19A1
SCHEMBL511962 0.73 HSD11B1 (0.34) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1078945-B1 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO LTD (KR) 2011-10-12 EP disclosed
US-7338743-B2 Resist material and pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2008-03-04 US disclosed
US-20060051702-A1 Resist material and pattern formation method BARINGS FINANCE LLC, AS COLLATERAL AGENT 2006-03-09 US disclosed
EP-1078945-A2 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO. LTD. (KR) 2001-02-28 EP disclosed