SCHEMBL24812562

SCHEMBL24812562

C=Cc1cc(C)c(OC(C)=O)c(I)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 3/20 0.40
▸ HTT P42858 2/20 0.40
▸ HSD17B10 Q99714 2/20 0.40
▸ TP53 P04637 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ GAA P10253 1/20 0.40
▸ ALDH1A1 P00352 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ POLB P06746 2/20 0.35
▸ NLRP3 Q96P20 1/20 0.35
▸ TUBB4A P04350 2/20 0.33
▸ TUBB P07437 2/20 0.33
▸ TUBA3C P0DPH7 2/20 0.33
▸ TUBA1B P68363 2/20 0.33
▸ TUBA4A P68366 2/20 0.33
▸ TUBB4B P68371 2/20 0.33
▸ TUBB3 Q13509 2/20 0.33
▸ TUBB2A Q13885 2/20 0.33
▸ TUBB8 Q3ZCM7 2/20 0.33
▸ TUBA3E Q6PEY2 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22991504 0.90 POLB (0.38) KDM4EHTTHSD17B10TP53MAPT
SCHEMBL8671926 0.88 KDM4E (0.45) KDM4EHTTHSD17B10TP53MAPT
SCHEMBL22991516 0.84 TOP1 (0.40) KDM4EHTTMAPTGAAALDH1A1
SCHEMBL22991517 0.82 HTT (0.47) KDM4EHTTHSD17B10TP53MAPT
SCHEMBL24110744 0.81 TUBB4A (0.50) KDM4EHTTHSD17B10GAAALDH1A1
SCHEMBL9151424 0.81 MAPT (0.40) KDM4EHTTHSD17B10TP53MAPT
SCHEMBL27428757 0.79 TUBB4A (0.51) KDM4EHTTHSD17B10GAAALDH1A1
SCHEMBL26617168 0.78 MEN1 (0.40) KDM4EHTTMAPTALDH1A1HPGD
SCHEMBL18290075 0.78 POLB (0.48) KDM4EHTTHSD17B10TP53MAPT
SCHEMBL22991509 0.76 POLB (0.38) KDM4EHTTHSD17B10TP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220413385-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN JSR CORPORATION (JP) 2022-12-29 — — US disclosed
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