⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21567950 | 0.90 | — | — | |
| SCHEMBL21567701 | 0.72 | ANPEP (0.31) | — | |
| SCHEMBL17130198 | 0.68 | — | — | |
| SCHEMBL19227705 | 0.66 | — | — | |
| SCHEMBL1106850 | 0.65 | ANPEP (0.33) | — | |
| SCHEMBL24835119 | 0.62 | — | — | |
| SCHEMBL21567693 | 0.58 | ANPEP (0.30) | — | |
| SCHEMBL20393244 | 0.58 | — | — | |
| SCHEMBL18387576 | 0.58 | LPL (0.37) | — | |
| SCHEMBL20868139 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230004085-A1 | METHOD FOR MANUFACTURING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PREMIX SOLUTION FOR PREPARING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING PHOTOSENSITIVE DRY FILM, AND METHOD FOR MANUFACTURING PATTERNED RESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-05 | — | — | US | disclosed |