SCHEMBL24859014

SCHEMBL24859014

O=C(Oc1ccc(OC(=O)c2cc(-c3ccccc3)nc(-c3ccccc3)n2)cc1)c1cc(-c2ccccc2)nc(-c2ccccc2)n1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.51
ADORA3 P0DMS8 3/20 0.49
TDP1 Q9NUW8 3/20 0.49
MAPK1 P28482 1/20 0.49
MEN1 O00255 5/20 0.49
KMT2A Q03164 5/20 0.49
NTSR1 P30989 1/20 0.49
ALDH1A1 P00352 4/20 0.48
HPGD P15428 3/20 0.48
NPSR1 Q6W5P4 2/20 0.48
GLA P06280 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
MCL1 Q07820 1/20 0.48
ADORA1 P30542 3/20 0.48
ADORA2A P29274 2/20 0.48
RXFP1 Q9HBX9 1/20 0.47
KDM4E B2RXH2 1/20 0.47
CYP2C19 P33261 1/20 0.47
LMNA P02545 1/20 0.46
MAOA P21397 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4265804 0.84 ALDH1A1 (0.57) MAPTADORA3MEN1KMT2ANTSR1
SCHEMBL24859013 0.83 MAPT (0.53) MAPTTDP1MAPK1MEN1KMT2A
SCHEMBL4265697 0.81 KMO (0.58) MAPTADORA3MEN1KMT2ANTSR1
SCHEMBL24859004 0.80 ADORA1 (0.51) MAPTADORA3TDP1MAPK1MEN1
SCHEMBL30925072 0.80 NPC1 (0.57) MAPTADORA3TDP1MAPK1MEN1
SCHEMBL29214354 0.80 NPC1 (0.57) MAPTADORA3TDP1MAPK1MEN1
SCHEMBL24859020 0.79 NPC1 (0.51) MAPTADORA3TDP1MEN1KMT2A
SCHEMBL2928253 0.79 MCL1 (0.66) MAPTADORA3ALDH1A1HPGDNPSR1
SCHEMBL19563151 0.79 KMT2A (0.53) MAPTTDP1MEN1KMT2ANTSR1
SCHEMBL29214320 0.79 ADORA1 (0.52) MAPTADORA3TDP1MAPK1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11550221-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound TOKYO OHKA KOG YO CO., LTD. (JP) 2023-01-10 US disclosed