⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7028000 | 0.86 | — | — | |
| SCHEMBL152169 | 0.79 | TSHR (0.39) | — | |
| SCHEMBL9342186 | 0.79 | NPSR1 (0.31) | — | |
| SCHEMBL3676797 | 0.76 | TSHR (0.31) | — | |
| SCHEMBL16227843 | 0.75 | TSHR (0.32) | — | |
| SCHEMBL5585810 | 0.75 | APEX1 (0.31) | — | |
| SCHEMBL21816726 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL28986659 | 0.73 | — | — | |
| SCHEMBL17938184 | 0.73 | APEX1 (0.31) | — | |
| SCHEMBL3779899 | 0.73 | APEX1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2034620-A | — | — | None | — | — | JP | disclosed |
| JP-2144505-A | — | — | None | — | — | JP | disclosed |
| JP-62290705-A | — | — | None | — | — | JP | disclosed |
| CN-114381155-B | Electron beam curable coating composition | 丰田自动车株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-115612000-A | Infrared light sensitive photo-curing composition | 保定乐凯新材料股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| US-11535766-B2 | Curable composition for inkjet printing, cured product of same, and electronic component having the cured product | TAIYO INK MFG. CO., LTD. (JP) | 2022-12-27 | — | — | US | disclosed |
| CN-115362184-A | Curable composition, cured product, and electronic component | 太阳油墨制造株式会社 | 2022-11-18 | — | — | CN | disclosed |
| CN-114153122-A | Cationic free radical polymerization composition for preparing LDI dry film and LDI dry film | 保定乐凯新材料股份有限公司 | 2022-03-08 | — | — | CN | disclosed |
| CN-114149530-A | Alkali-soluble polymer for preparing LDI dry film and preparation method thereof | 保定乐凯新材料股份有限公司 | 2022-03-08 | — | — | CN | disclosed |
| EP-3778793-A1 | CURABLE COMPOSITION FOR INKJET PRINTING, CURED PRODUCT OF SAME, AND ELECTRONIC COMPONENT HAVING THE CURED PRODUCT | Taiyo Ink Mfg. Co., Ltd. (JP) | 2021-02-17 | — | — | EP | disclosed |
| JP-H02144505-A | METHOD FOR REMOVING WIRE ROD COATING | SUMITOMO ELECTRIC IND LTD | 1990-06-04 | — | — | JP | disclosed |
| US-4920037-A | Printed circuits | MITSUBISHI KASEI CORPORATION (JP) | 1990-04-24 | — | — | US | disclosed |
| JP-H0234620-A | PHOTOCURABLE RESIN COMPOSITION | MITSUI TOATSU CHEM INC | 1990-02-05 | — | — | JP | disclosed |
| EP-0301733-A1 | Photocuring resin compositions | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-02-01 | — | — | EP | disclosed |
| EP-0167042-B1 | CURABLE RESIN COMPOSITIONS | Takeda Chemical Industries, Ltd. (JP) | 1988-09-21 | — | — | EP | disclosed |
| JP-S62290705-A | PHOTOPOLYMERIZABLE COMPOSITION | MITSUBISHI CHEM IND LTD | 1987-12-17 | — | — | JP | disclosed |
| EP-0249468-A2 | Photopolymerizable composition | MITSUBISHI KASEI CORPORATION (JP) | 1987-12-16 | — | — | EP | disclosed |
| EP-0223217-A2 | Stabilized resin solutions | Takeda Chemical Industries, Ltd. (JP) | 1987-05-27 | — | — | EP | disclosed |
| US-4613652-A | Curable resin compositions | TAKEDA CHEMICAL INDUSTRIES, INC. (JP) | 1986-09-23 | — | — | US | disclosed |
| EP-0167042-A1 | Curable resin compositions | Takeda Chemical Industries, Ltd. (JP) | 1986-01-08 | — | — | EP | disclosed |