Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | CPA1 | P15085 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27096646 | 0.74 | TSHR (0.33) | TSHR | |
| SCHEMBL547124 | 0.73 | TSHR (0.36) | TSHR | |
| SCHEMBL27533732 | 0.73 | — | — | |
| SCHEMBL4435546 | 0.72 | MEN1 (0.43) | MEN1KMT2ATSHR | |
| SCHEMBL17206269 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL18979664 | 0.70 | TSHR (0.33) | TSHR | |
| Water SCHEMBL17701316 | 0.70 | — | — | |
| Acetic Acid SCHEMBL4557323 | 0.69 | CA1 (0.47) | TSHR | |
| SCHEMBL204748 | 0.69 | MEN1 (0.33) | MEN1KMT2ACPA1 | |
| SCHEMBL143991 | 0.68 | MEN1 (0.75) | MEN1KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10283230-B2 | Production method for coating liquid for formation of transparent conductive film | SUMITOMO METAL MINING CO., LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-9701849-B2 | Method of manufacturing transparent conductive film, the transparent conductive film, element and transparent conductive substrate using the film, as well as device using the substrate | SUMITOMO METAL MINING CO., LTD. (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20150232674-A1 | PRODUCTION METHOD FOR COATING LIQUID FOR FORMATION OF TRANSPARENT CONDUCTIVE FILM | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| US-9040119-B2 | Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-8963146-B2 | Method of manufacturing transparent conductive film, the transparent conductive substrate using the film, as well as device using the substrate | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-02-24 | — | — | US | disclosed |
| US-8753987-B2 | Method of manufacturing metal oxide film | SUMITOMO METAL MINING CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130101867-A1 | METHOD OF MANUFACTURING METAL OXIDE FILM, METAL OXIDE FILM, ELEMENT USING THE METAL OXIDE FILM, SUBSTRATE WITH METAL OXIDE FILM, AND DEVICE USING THE SUBSTRATE WITH METAL OXIDE FILM | SUMITOMO METAL MINING CO., LTD. (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20120313055-A1 | METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM, THE TRANSPARENT CONDUCTIVE FILM, ELEMENT AND TRANSPARENT CONDUCTIVE SUBSTRATE USING THE FILM, AS WELL AS DEVICE USING THE SUBSTRATE | SUMITOMO METAL MINING CO.LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120223302-A1 | METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM, THE TRANSPARENT CONDUCTIVE SUBSTRATE USING THE FILM, AS WELL AS DEVICE USING THE SUBSTRATE | SUMITOMO METAL MINING CO., LTD. (JP) | 2012-09-06 | — | — | US | disclosed |
| US-20110229737-A1 | METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE SUBSTRATE AND DEVICE COMPRISING THE SAME | SUMITOMO METAL MINING CO., LTD. (JP) | 2011-09-22 | — | — | US | disclosed |
| US-5457218-A | Precursor and related method of forming for use in forming electrochromic coatings | DONNELLY CORPORATION (US) | 1995-10-10 | — | — | US | disclosed |
| US-5252354-A | Method for depositing electrochromic layers | DONNELLY CORPORATION (US) | 1993-10-12 | — | — | US | disclosed |
| US-4959247-A | Electrochromic coating and method for making same | DONNELLY CORPORATION (US) | 1990-09-25 | — | — | US | disclosed |
| US-4420500-A | Composition and process for preparing transparent conducting film | HITACHI, LTD. (JP) | 1983-12-13 | — | — | US | disclosed |