SCHEMBL249114

SCHEMBL249114

CCCS(=O)(=O)Oc1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.57
MMP2 P08253 2/20 0.50
MMP9 P14780 2/20 0.50
MMP14 P50281 2/20 0.50
MMP7 P09237 1/20 0.50
CA2 P00918 4/20 0.48
CA1 P00915 2/20 0.48
CA9 Q16790 2/20 0.48
CA12 O43570 2/20 0.48
ENPP3 O14638 1/20 0.46
ENPP1 P22413 1/20 0.46
ENPP2 Q13822 1/20 0.46
ALDH1A1 P00352 2/20 0.43
HTT P42858 2/20 0.43
LMNA P02545 2/20 0.43
PTGS1 P23219 1/20 0.43
LTA4H P09960 2/20 0.42
KDM4E B2RXH2 1/20 0.42
PABPC1 P11940 1/20 0.41
EIF4H Q15056 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27333112 0.98 KMT2A (0.55) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL27865574 0.98 KMT2A (0.55) KMT2AMMP2MMP9MMP14MMP7
Acetic Acid SCHEMBL4067553 0.93 KMT2A (0.50) KMT2AMMP2MMP9MMP14MMP7
Sulfuric Acid SCHEMBL2811791 0.89 KMT2A (0.47) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL3863280 0.88 KMT2A (0.53) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL779566 0.87 KMT2A (0.72) KMT2AMMP2MMP9MMP14CA2
SCHEMBL28444853 0.86 KMT2A (0.52) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL27608810 0.86 KMT2A (0.52) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL1502053 0.86 KMT2A (0.52) KMT2AMMP2MMP9MMP14MMP7
SCHEMBL886892 0.85 KMT2A (0.50) KMT2AMMP9CA2CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117062423-A Magnetic composite corrosion-resistant wave-absorbing material and application 攀枝花学院 2023-11-14 CN claimed
CN-115612573-A Formula and using method of adhesive remover for curing silicone adhesive 圣戈班汇杰(杭州)新材料有限公司 2023-01-17 CN claimed
WO-2008076046-A1 NOVEL 2-AMINO-5, 5-DIARYL-IMIDAZOL-4-ONES ASTRAZENECA AB (SE) 2008-06-26 WO claimed
CN-101078892-A Composition and method for photoresist removal AIR PROD & CHEM (US) 2007-11-28 CN claimed
EP-4736890-A2 PROCESS FOR PRODUCTION OF KETOCARBOXYLIC ACID VINYL ESTERS QuantView GmbH (DE) 2026-05-06 EP disclosed
EP-4710950-A2 PROCESS FOR PRODUCTION OF KETOCARBOXYLIC ACID VINYL ESTERS QuantView GmbH (DE) 2026-03-18 EP disclosed
EP-4416127-B1 PROCESS FOR PRODUCTION OF KETOCARBOXYLIC ACID VINYL ESTERS QUANTVIEW GMBH (DE) 2026-03-11 EP disclosed
US-12466989-B2 Microemulsions and uses thereof PETROLIAM NASIONAL BERHAD (PETRONAS) (MY) 2025-11-11 US disclosed
CN-120037862-A Reaction kettle for preparing high molecular weight hindered phenol antioxidant and preparation method of antioxidant 大庆汉光实业股份有限公司 2025-05-27 CN disclosed
WO-2025070154-A1 POLYAMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT 東レ株式会社 2025-04-03 WO disclosed
WO-2025063188-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED PRODUCT 東レ株式会社 2025-03-27 WO disclosed
US-20240400489-A1 PROCESS FOR PRODUCTION OF KETOCARBOXYLIC ACID VINYL ESTERS UNIV KIEL CHRISTIAN ALBRECHTS (DE) 2024-12-05 US disclosed
CN-1278953-A Nonaqueous electrolyte battery MITSUBISHI CHEM CORP (JP) 2001-01-03 CN disclosed
EP-1030399-A1 NON-AQUEOUS ELECTROLYTE CELL MITSUBISHI CHEMICAL CORPORATION (JP) 2000-08-23 EP disclosed
US-5981146-A CONTAINING A COMPOUND HAVING A SULFONIC ACID GROUP OR A CARBONIC ACID GROUP IS FORMED ON A CHEMICAL-AMPLIFICATION-TYPE RESIST FILM OF A SEMICONDUCTTOR SUBSTRATE, FOLLOWED BY PERFORMING EXPOSURE MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1999-11-09 US disclosed
US-4944893-A FOR SEMICONDUCTORS, ACETYLENIC ALCOHOL TOKYO OHKA KOGYO CO., LTD. (JP) 1990-07-31 US disclosed
CN-1007897-B NOVEL CATALYST COMPOSTIONS AND PROCESS FOR THE COPOLYMERIZATION OF ETHONE WITH CARBON MONOXIDE SHELL INT RESEARCH (NL) 1990-05-09 CN disclosed
CN-86107886-A The copolymerization process of novel catalyst composition and ethene and carbon monoxide 1987-06-17 CN disclosed
US-4514189-A SLURRY WITH AROMATIC-ALDEHYDE RESIN DIAMOND SHAMROCK CHEMICALS COMPANY (US) 1985-04-30 US disclosed
US-4113638-A NEUTRALIZED SULFONIC ACID OR NEUTRALIZED SULFURIC ACID ESTER, AND NEUTRALIZED DIPROPYLBENZENESULFONATE OR MIXTURE OF NEUTRALIZED ALKYLBENZENESULFONATES ATLANTIC RICHFIELD COMPANY (US) 1978-09-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240400489-A1 PROCESS FOR PRODUCTION OF KETOCARBOXYLIC ACID VINYL ESTERS PCCA, DHCR24, PC KMT2A 1079/4885MMP2 2199/4885MMP9 2707/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.