⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL28571060 | 0.96 | — | — | |
| Cyclopropane SCHEMBL2778382 | 0.90 | THRB (0.42) | — | |
| SCHEMBL31500925 | 0.86 | THRB (0.44) | — | |
| SCHEMBL28147383 | 0.85 | THRB (0.38) | — | |
| SCHEMBL27543129 | 0.83 | — | — | |
| Acetic Acid SCHEMBL28497107 | 0.83 | ALDH1A1 (0.38) | — | |
| SCHEMBL9485098 | 0.77 | — | — | |
| SCHEMBL8402515 | 0.76 | THRB (0.36) | — | |
| SCHEMBL350348 | 0.74 | THRB (0.35) | — | |
| SCHEMBL37218 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022042577-A1 | PREPARATION METHOD FOR PYRROLOPYRIMIDINE COMPOUND | 北京普祺医药科技有限公司 | 2022-03-03 | — | — | WO | claimed |
| CN-107793364-A | A kind of method for synthesizing 5 Flucytosines | 新乡拓新药业股份有限公司 | 2018-03-13 | — | — | CN | claimed |
| EP-0887705-B1 | Resist compositions | SHINETSU CHEMICAL CO (JP) | 2002-09-04 | — | — | EP | claimed |
| EP-0558280-A1 | Chemically amplified resist | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-01 | — | — | EP | claimed |
| CN-118251469-A | Aqueous inkjet inks containing polyurethane polymers | 杜邦电子公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-111107830-B | Liquid hair dye composition | 花王株式会社 | 2022-11-29 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| CN-110959137-A | Resist compositions and methods containing novel multi-trigger monomers | A·P·G·罗宾森 | 2020-04-03 | — | — | CN | disclosed |
| CN-110415978-A | Electrolytic capacitor and the method for manufacturing electrolytic capacitor | TOKIN CORP | 2019-11-05 | — | — | CN | disclosed |
| CN-105038817-B | Aligning agent for liquid crystal, liquid crystal orientation film and its manufacturing method, liquid crystal display element, polymer and compound | JSR株式会社 | 2019-02-01 | — | — | CN | disclosed |
| EP-0887705-A1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5695911-A | CONTAINING PHTHALOCYANINE COMPOUND | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1997-12-09 | — | — | US | disclosed |
| US-5580695-A | POLYHYDROXYSTYRENE AS ALKALI-SOLUBLE RESIN; TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE AS ACID GENERATING AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| US-5380842-A | Color filters | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1995-01-10 | — | — | US | disclosed |
| CN-1076948-A | Water-based anticorrosive paint and preparation method thereof | AOFEIDA SCIENCE AND TECH CO BE (CN) | 1993-10-06 | — | — | CN | disclosed |
| EP-0562819-A2 | Resist coating composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-29 | — | — | EP | disclosed |
| EP-0558280-A1 | Chemically amplified resist | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |
| EP-0519423-A2 | Phthalocyanine compounds and usage thereof | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1992-12-23 | — | — | EP | disclosed |