SCHEMBL2492859

SCHEMBL2492859

O=c1ccc2ccc3c(c2o1)CCCN3

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIA1 P42261 1/20 0.45
GRIA2 P42262 1/20 0.45
GRIA3 P42263 1/20 0.45
GRIA4 P48058 1/20 0.45
KDM4E B2RXH2 7/20 0.43
ALDH1A1 P00352 7/20 0.43
LMNA P02545 4/20 0.43
MAPT P10636 3/20 0.43
GAA P10253 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
USP2 O75604 1/20 0.43
RECQL P46063 1/20 0.43
TLR9 Q9NR96 1/20 0.43
HPGD P15428 5/20 0.42
HSD17B10 Q99714 3/20 0.42
PRKD1 Q15139 3/20 0.42
CYP1A2 P05177 2/20 0.42
CYP3A4 P08684 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2491847 0.98 GRIA1 (0.44) GRIA1GRIA2GRIA3GRIA4KDM4E
SCHEMBL25822880 0.76 PRKD1 (0.46) GRIA1GRIA2GRIA3GRIA4KDM4E
SCHEMBL27678258 0.73 KDM4E (0.55) KDM4EALDH1A1LMNAMAPTGAA
SCHEMBL4929162 0.72 GRIA1 (0.55) GRIA1GRIA2GRIA3GRIA4KDM4E
SCHEMBL3261873 0.71 KDM4E (0.48) GRIA1GRIA2GRIA3GRIA4KDM4E
SCHEMBL3262044 0.70 KDM4E (0.47) GRIA1GRIA2GRIA3GRIA4KDM4E
SCHEMBL27678257 0.70 KDM4E (0.52) KDM4EALDH1A1LMNAMAPTGAA
SCHEMBL24176570 0.69 ATM (0.55) KDM4EALDH1A1LMNAMAPTGAA
SCHEMBL11552058 0.69 ATM (0.58) KDM4EALDH1A1LMNAMAPTGAA
SCHEMBL7098571 0.66 GRIA1 (0.46) GRIA1GRIA2GRIA3GRIA4KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
WO-2022004290-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR MANUFACTURING PLATING MOLD-ATTACHED SUBSTRATE, AND METHOD FOR MANUFACTURING PLATED OBJECT 東京応化工業株式会社 2022-01-06 WO disclosed
EP-2364298-A1 Quinolone compound and pharmaceutical composition Otsuka Pharmaceutical Co., Ltd. (JP) 2011-09-14 EP disclosed
WO-2010064735-A1 QUINOLONE COMPOUND AND PHARMACEUTICAL COMPOSITION OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2010-06-10 WO disclosed